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IC Mask SemiWiki Webinar Banner
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WEBINAR: Real time Parasitic Estimations using WSPs

WEBINAR: Real time Parasitic Estimations using WSPs
by Daniel Nenni on 10-17-2023 at 10:00 am

ICMask Parasitic Est. OCT Webinar 800x100 (1)

A major challenge in the field of layout design lies in the post-layout parasitic extraction process, which often introduces delays and the potential for significant modifications in the layout. This paper introduces a novel approach to address this challenge, providing real-time parasitic estimations using Width Spacing Patterns (WSPs).

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Traditionally, parasitic extraction occurs after a layout or multiple hierarchical layouts are completed, leading to potential delays in project timelines and even worse deterioration of the overall layout quality. Even minor adjustments can extend the process, sometimes requiring a complete redesign. To mitigate these issues and streamline the layout process, a dynamic solution is needed.

The proposed technique integrates parasitic resistance and capacitance values into WSPs, allowing real-time parasitic estimations during the wiring phase. This approach offers early and reasonably accurate estimation of parasitic effects specific to individual nets, resulting in higher-quality layouts from the start. It also enhances the translation of schematic specifications to the layout. Additionally, it provides compatibility with various metal layers embedded in WSPs, offering flexibility to meet diverse layout requirements.

One key advantage of this approach is its support for debugging through post-layout extractions. It provides a detailed breakdown of parasitic effects per metal layer, distinguishing between device and metal-added parasitics. This technique is seamlessly integrated with the CDT and PG-Pcell approach, ensuring compatibility with existing layout practices.

In conclusion, this innovative technique empowers layout engineers with real-time access to parasitic information. Not only does it enhance the initial quality of layouts, but it also reduces the likelihood of significant post-layout modifications. This leads to valuable time and effort savings throughout the entire layout life cycle, ultimately improving efficiency and the overall quality of the layout and schematics.

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Abstract:

Parasitic extraction is crucial for ensuring layout adherence to specifications, but it often causes delays and potential redesigns. To address this, a dynamic approach has been proposed, integrating resistance and capacitance values into Width Spacing Patterns (WSPs) for real-time parasitic extraction during the wiring process.

This technique offers early and accurate parasitic estimation, improving layout quality from the start and facilitating better schematic-to-layout translation. Overall, this approach saves time and effort throughout the layout life cycle, reducing the need for significant changes after post-layout parasitic extraction.

As Technical Lead at IC Mask Design, Gaurav Masiwal works with an exceptional team of skilled Layout Engineers, delivering high-quality layout solutions for various projects across different foundries and nodes. Gaurav has over 8 years of experience in physical implementation, specializing in Analog, RF, and mixed-signal integrated circuits.

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Also Read:

WEBINAR: FinFET UltraPcell Methodology

WEBINAR: PG Pcells- A Correct by Construction Power and Ground Distribution Strategy

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