WP_Term Object
(
    [term_id] => 159
    [name] => Siemens EDA
    [slug] => siemens-eda
    [term_group] => 0
    [term_taxonomy_id] => 159
    [taxonomy] => category
    [description] => 
    [parent] => 157
    [count] => 752
    [filter] => raw
    [cat_ID] => 159
    [category_count] => 752
    [category_description] => 
    [cat_name] => Siemens EDA
    [category_nicename] => siemens-eda
    [category_parent] => 157
)
Q2FY24TessentAI 800X100 
WP_Term Object
(
    [term_id] => 159
    [name] => Siemens EDA
    [slug] => siemens-eda
    [term_group] => 0
    [term_taxonomy_id] => 159
    [taxonomy] => category
    [description] => 
    [parent] => 157
    [count] => 752
    [filter] => raw
    [cat_ID] => 159
    [category_count] => 752
    [category_description] => 
    [cat_name] => Siemens EDA
    [category_nicename] => siemens-eda
    [category_parent] => 157
)
Siemens EDA
Posted on by glforte

Get the Latest Info on DFM at the SPIE Litho Conference

Get the Latest Info on DFM at the SPIE Litho Conference
by glforte on 01-29-2013 at 2:12 pm
Categories: EDA, Siemens EDA

While the SPIE Advanced Lithography conference is best known for IC manufacturing, computational lithography, mask preparation and other back-end topics, there is also a significant amount of interest in Design for Manufacturing (DFM) at the conference because some litho issues are best (or only) addressed by modifying the physical design or layout. At the upcoming SPIE Conference (Feb 24-28, San Jose Convention Center), Mentor will present three papers on DFM:

  • Pioneering an on-the-fly simulation technique for the detection of layout-dependent effects during IC design phase, Amr M. S. T. Abdelwahed, Mentor Graphics Egypt (Egypt); Rami Fathy, Mentor Graphics Corp. (Canada); Ahmed Ramadan, Mentor Graphics Egypt (Egypt), 27 February 2013 • 2:40 – 3:00 PM
  • A novel algorithm for automatic arrays detection in a layout, Marwah Shafee, Mentor Graphics Egypt (Egypt); Jea-Woo Park, Ara Aslyan, Juan Andres Torres, Mentor Graphics Corp. (United States); Kareem Madkour, Mentor Graphics Egypt (Egypt)Wael ElManhawy, Mentor Graphics Corp. (United States), 28 February 2013 • 11:50 PM – 12:10 AM
  • Model-based hints for litho-hotspot fixing beyond 20nm node, Jae-Hyun Kang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of); Sarah Mohamed, Mentor Graphics Egypt (Egypt); Wael ElManhawy, Mentor Graphics Corp. (United States); Byung-Moo Kim, Naya Ha, SAMSUNG Electronics Co., Ltd. (Korea, Republic of); Hung Bok Choi, Kee Sup Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of); Jean-Marie Brunet, Joe Kwan, Mentor Graphics Corp. (United States); Kareem Madkour, Mentor Graphics Egypt (Egypt); Evan Lee, Mentor Graphics Korea (Korea, Republic of), 28 February 2013 • 3:30 – 3:50 PM

You might want to catch these live and talk to the authors. Alternately, you can access them through this SPIE link http://spie.org/x14168.xml or the IEEE technical library service. For a list of all 13 Mentor papers at SPIE, click here.

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