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TSMC Banner 2023
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TSMC 2022 Technology Symposium Review – Advanced Packaging Development

TSMC 2022 Technology Symposium Review – Advanced Packaging Development
by Tom Dillinger on 06-27-2022 at 6:00 am

3D blox

TSMC recently held their annual Technology Symposium in Santa Clara, CA.  The presentations provide a comprehensive overview of their technology status and upcoming roadmap, covering all facets of the process technology and advanced packaging development.  This article will summarize the highlights of the advanced packaging… Read More


TSMC 2022 Technology Symposium Review – Process Technology Development

TSMC 2022 Technology Symposium Review – Process Technology Development
by Tom Dillinger on 06-22-2022 at 5:00 am

finFLEX

TSMC recently held their annual Technology Symposium in Santa Clara, CA.  The presentations provided a comprehensive overview of their status and upcoming roadmap, covering all facets of process technology and advanced packaging development.  This article will summarize the highlights of the process technology updates… Read More


Three Key Takeaways from the 2022 TSMC Technical Symposium!

Three Key Takeaways from the 2022 TSMC Technical Symposium!
by Daniel Nenni on 06-16-2022 at 12:10 pm

TSMC Technology Roadmap 2022

The TSMC Technical Symposium is today so I wanted to give you a brief summary of what was presented. Tom Dillinger will do a more technical review as he has done in the past. I don’t want to steal his thunder but here is what I think are the key takeaways. First a brief history lesson.

The history of TSMC Technology Development with 12 keyRead More


Inverse Lithography Technology – A Status Update from TSMC

Inverse Lithography Technology – A Status Update from TSMC
by Tom Dillinger on 06-02-2022 at 6:00 am

ILT mask rules

“Inverse lithography technology (ILT) represents the most significant EDA advance in the last two decades.”  Danping Peng from TSMC made that assertion at the recent SPIE Advanced Lithography + Patterning Conference, in his talk entitled:  ILT for HVM:  History, Present, and Future.  This article summarizes the highlights… Read More


TSMC N3 will be a Record Setting Node!

TSMC N3 will be a Record Setting Node!
by Daniel Nenni on 05-19-2022 at 6:00 am

waferr007 2518 Q9Wf 0

With the TSMC Technical Symposium coming next month there is quite a bit of excitement inside the fabless semiconductor ecosystem. Not only will TSMC give an update on N3, we should also hear details of the upcoming N2 process.

Hopefully TSMC will again share the number of tape-outs confirmed for their latest process node. Given… Read More


Intel and the EUV Shortage

Intel and the EUV Shortage
by Scotten Jones on 04-13-2022 at 10:00 am

Slide1

In my “The EUV Divide and Intel Foundry Services” article available here, I discussed the looming EUV shortage. Two days ago, Intel announced their first EUV tool installed at their new Fab 34 in Ireland is a tool they moved from Oregon. This is another indication of the scarcity of EUV tools.

I have been tracking EUV system production… Read More


Can Intel Catch TSMC in 2025?

Can Intel Catch TSMC in 2025?
by Scotten Jones on 04-11-2022 at 6:00 am

Slide6

At the ISS conference held from April 4th through 6th I presented on who I thought would have the leading logic technology in 2025. The following is a write up of that presentation.

ISS was a virtual conference in 2021 and I presented on who currently had logic leadership and declared TSMC the clear leader. Following that conference,… Read More


TSMC’s Reliability Ecosystem

TSMC’s Reliability Ecosystem
by Tom Dillinger on 04-06-2022 at 10:00 am

AC accelerated stress conditions

TSMC has established a leadership position among silicon foundries, based on three foundational principles:

  • breadth of technology support
  • innovation in technology development
  • collaboration with customers

Frequent SemiWiki readers have seen how these concepts have been applied to the fabrication and packaging technology… Read More


The EUV Divide and Intel Foundry Services

The EUV Divide and Intel Foundry Services
by Scotten Jones on 03-23-2022 at 10:00 am

Intel IDM 2.0 Process Roadmap
The EUV Divide

I was recently updating an analysis I did last year that looked at EUV system supply and demand, while doing this I started thinking about Intel and their Fab portfolio.

If you look at Intel’s history as a microprocessor manufacturer, they are typically ramping up their newest process node (n), in volume production… Read More


Self-Aligned Via Process Development for Beyond the 3nm Node

Self-Aligned Via Process Development for Beyond the 3nm Node
by Tom Dillinger on 01-05-2022 at 6:00 am

TEM DoD

The further scaling of interconnect and via lithography for advanced nodes is challenged by the requirement to provide a process window that supports post-patterning critical dimension variations and mask overlay tolerances.  At the recent international Electron Devices Meeting (IEDM) in San Francisco, TSMC presented … Read More