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Integrating your SoC into the analog world

Integrating your SoC into the analog world
by Don Dingee on 01-02-2013 at 7:00 pm

Our world is decidedly analog, made up of stimuli for our five basic senses of sight, touch, hearing, taste, and smell, and more advanced senses like balance and acceleration. To be effective on the Internet of Things, digital devices must integrate with the analog world, interfacing with sensors and control elements.… Read More


The Semiconductor Landscape – II

The Semiconductor Landscape – II
by Pawan Fangaria on 01-01-2013 at 9:15 pm

It has been a year since my article Semiconductor Landscape in Jan 2012 I wanted to look back into the major events over the year and then anticipate what’s in store going forward. What has happened over the year is much more than what I could foresee. Major consolidation in EDA space – Synopsys acquired Magma, SpringSoft, Ciranova,Read More


FinFET Modeling and Extraction at 16-nm

FinFET Modeling and Extraction at 16-nm
by Daniel Payne on 12-18-2012 at 12:05 pm

In 2012 FinFET is one of the most talked about MOS technologies of the year because traditional planar CMOS has slowed down on scaling below the 28nm node. To learn more about FinFET process modeling I attended a Synopsys webinar where Bari Biswas presented for about 42 minutes include a Q&A portion at the end.


Bari Biswas, SynopsysRead More


A Brief History of Synopsys

A Brief History of Synopsys
by Daniel Nenni on 12-12-2012 at 1:00 pm

One of the largest software companies in the world, Synopsys is a market and technology leader in the development and sale of electronic design automation (EDA) tools and semiconductor intellectual property (IP). Synopsys is also a strong supporter of local education through the Synopsys Outreach Foundation. Each year in multiple… Read More


Double Patterning Verification

Double Patterning Verification
by Paul McLellan on 12-10-2012 at 3:03 am

You can’t have failed to notice that 20nm is coming. There are a huge number of things that are different about 20nm from 28nm, but far and away the biggest is the need for double patterning. You probably know what this is by now, but just in case, here is a quick summary.

Lithography is done using 193nm light. Today we use immersion… Read More


Second FPGA to the right, and straight on ‘til it works

Second FPGA to the right, and straight on ‘til it works
by Don Dingee on 11-26-2012 at 6:00 pm

In a fantasy world where there were no coding errors or integration issues, FPGA designs would fly straight through synthesis easily and quickly. Maybe that world does exist somewhere. For the rest of us, who have experienced the agony of running a large FPGA design – again – only to find another error and have to start over, there … Read More


Next Generation FPGA Prototyping

Next Generation FPGA Prototyping
by Paul McLellan on 11-12-2012 at 7:00 am

One technology that has quietly gone mainstream in semiconductor design is FPGA prototyping. That is, using an FPGA version of the design to run extensive verification. There are two approaches to doing this. The first way is simply to build an prototype board, buy some FPGAs from Xilinx or Altera and do everything yourself. The… Read More


Static Timing Analysis for Memory Characterization

Static Timing Analysis for Memory Characterization
by Daniel Payne on 11-11-2012 at 6:18 pm

Modern SoC (System On Chip) designs contain a larger number of RAM (Random Access Memory) instances, so how do you know what the speed, timing and power are for any instance? There are a couple of approaches:
[LIST=1]

  • Trust the IP supplier to give you models that use polynomial equations to curve-fit the performance numbers based
  • Read More

    Simulation: Expert Insights into Modeling Microcontrollers @ Renesas DevCon

    Simulation: Expert Insights into Modeling Microcontrollers @ Renesas DevCon
    by Holly Stump on 10-25-2012 at 9:03 pm

    Simulation: Expert Insights into Modeling Microcontrollers” was the recent panel hot topic at Renesas DevCon2012, featuring Paolo Giustoof GM, Mark Ramseyerof Renesas, Marc Serughettiof Synopsys, Jay Yantchevof ASTC / VWorks, and Simon Davidmannof Imperas.
    Read More


    Learning about MEMS in Israel from: EDA companies, Foundry, University, Users

    Learning about MEMS in Israel from: EDA companies, Foundry, University, Users
    by Daniel Payne on 10-23-2012 at 12:24 pm

    In April I attended and blogged about a webinar on MEMS and IC co-design hosted by two EDA companies: SoftMEMS and Tanner EDA. On October 30th you can attend a full-day event in Israel that is more comprehensive than the webinar that I attended.… Read More