TSMC held its Open Innovation Platform Forum the other week on September 13[SUP]th[/SUP]. Each year the companies that exhibit at this event choose to highlight their latest technology. One of the most interesting presentations that I received during the event was from Solido. In recent years they have produced a number of groundbreaking… Read More
The TSMC OIP Ecosystem Forum is upon us and what better place to debut a new tool to prevent silicon failures. Solido Design Automation just launched its latest tool – PVTMC Verifier – and will be demonstrating it in their booth at OIP. This is the third product that was developed within its Machine Learning Labs and is… Read More
Traditionally, EDA has been a brute force methodology where we buy more software licenses and more CPUs and keep running endless jobs to keep up with the increasing design and process complexities. SPICE simulation for example; when I meet chip designers (which I do quite frequently) I ask them how many simulations they do for a … Read More
Semiconductor design is littered with complex, data-driven challenges where the cost of error is high. Solido’s new ML (machine learning) Labs, based on Solido’s ML technologies developed over the last 12 years, allows semiconductor companies to collaboratively work with Solido in developing new ML-based EDA products.
Data… Read More
Standard cell, memory, and I/O library characterization is a necessary, but time-consuming, resource intensive, and error-prone process. With the added complexity of advanced and low power manufacturing processes, fast and accurate statistical and non-statistical characterization is challenging, creating the need … Read More
Variation is still the tough nut to crack for advanced process nodes. The familiar refrain of lower operating voltages and higher performance requirements make process variation an extremely important design consideration. As far back as the early 2000’s design teams have been looking for a better approach to model variation… Read More
When pushing the boundaries of power and performance in leading edge memory designs, yield is always an issue. The only way to ensure that memory chips will yield is through aggressive simulation, especially at process corners to predict the effects of variation. In a recent video posted on the Solido website, John Barth of Invecas… Read More
The impact of process variation at advanced nodes is increasing — no surprise there. In recent years, the principal design emphasis to better reflect this variation has been the adoption of two new methodologies: (1) advanced on-chip variation (AOCV, as well as POCV/LVF) for digital static timing analysis, and (2) advanced… Read More
I want to compliment ChipGuy on a very nice write-up of a complex topic – how to model process variation in static timing.
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When technology advances, complexities increase and data size becomes unmanageable. Fresh thinking and a new environment for automation are needed to provide the required increase in productivity. Specifically in case of circuit simulation of advanced-node analog designs, where precision is paramount and a large number… Read More