Dinesh Bettadapur serves as the Chief Executive Officer of Irresistible Materials Ltd. Dinesh has over 20 years of executive management experience in the semiconductor industries and has held significant leadership roles encompassing general management, P&L management, sales, business development, strategic alliances,… Read More
Tag: high NA EUV
Rethinking Multipatterning for 2nm Node
Whether EUV or DUV doesn’t matter at 20 nm pitch
The International Roadmap for Devices and Systems, 2022 Edition, indicates that the “2nm” node due in 2025 (this year) has a minimum (metal) half-pitch of 10 nm [1]. This is, in fact, less than the resolution of a current state-of-the-art EUV system, with a numerical aperture… Read More
Trump whacking CHIPS Act? When you hold the checkbook, you make up the new rules
- News reports that Trump will change CHIPS Act to suit his views
- We specifically predicted this months ago as deals closed 11th hour
- Blue states, enemies list & foreign entities likely to get cut
- Big changes/cuts likely to a program Trump roundly criticized
Reuters: Exclusive: Trump prepares to change US CHIPS Act conditions,… Read More
Intel High NA Adoption
On Friday April 12th Intel held a press briefing on their adoption of High NA EUV with Intel fellow and director of lithography Mark Phillips.
In 1976 Intel built Fab 4 in Oregon, the first Intel fab outside of California. With the introduction of 300mm Oregon became the only development site for Intel with large manufacturing, development,… Read More
ASML- Soft revenues & Orders – But…China 49% – Memory Improving
ASML- better EPS but weaker revenues- 2024 recovery on track
China jumps 10% to 49%- Memory looking better @59% of orders
Order lumpiness increases with ASP- EUV will be up-DUV down
“Passing Bottom” of what has been a long down cycle
Weak revenues & orders but OK EPS
Reported revenue was Euro5.3B and EPS of Euro3.11… Read More
SPIE Let there be Light! High NA Kickoff! Samsung Slows? “Rapid” Decline?
– High NA EUV’s coming out party – “Dawn” of the Angstrom Era
– Well attended, positive vibes, not much new but good progress
– Concerns about Samsung slowing spend while Intel accelerates
– KLA reticle inspection quandary – Risky business in China
SPIE was a High-NA
… Read MorePinning Down an EUV Resist’s Resolution vs. Throughput
The majority of EUV production is on 5nm and 3nm node, implemented by late 2022. Metal oxide resists have not been brought into volume production yet [1,2], meaning that only organic chemically amplified resists (CARs) have been used instead until now. These resists have a typical absorption coefficient of 5/um [3,4], which means
ASML – Strong order start on long road to 2025 recovery – 24 flat vs 23 – EUV shines
– ASML orders more than triple sequentially- Utilization increases
– Management remains conservative with flat revenues 2024 vs 2023
– Recovery will be slow, targeting 2025- Long & weak cyclical bottom
– Litho orders are leading indicator of future wider recovery
Strong orders pave the way for
… Read MoreIs Intel cornering the market in ASML High NA tools? Not repeating EUV mistake
- Reports suggest Intel will get 6 of 10 ASML High NA tools in 2024
- Would give Intel a huge head start over TSMC & Samsung
- A big gamble but a potentially huge pay off
- Does this mean $4B in High NA tool sales for ASML in 2024?
News suggests Intel will get 6 of first 10 High NA tools made by ASML in 2024
An industry news source, Trendforce, reports… Read More
SPIE- EUV & Photomask conference- Anticipating High NA- Mask Size Matters- China
– SPIE EUV & Photomask conference well attended with great talks
– Chip industry focused on next gen High NA EUV & what it impacts
– Do big chips=big masks? Another Actinic tool?
– AI & chip tools, a game changer- China pre-empting more sanctions