CEO Interview with Dinesh Bettadapur of Irresistible Materials

CEO Interview with Dinesh Bettadapur of Irresistible Materials
by Daniel Nenni on 03-12-2025 at 10:00 am

D. Bettadapur photo IM

Dinesh Bettadapur serves as the Chief Executive Officer of Irresistible Materials Ltd. Dinesh has over 20 years of executive management experience in the semiconductor industries and has held significant leadership roles encompassing general management, P&L management, sales, business development, strategic alliances,… Read More


Rethinking Multipatterning for 2nm Node

Rethinking Multipatterning for 2nm Node
by Fred Chen on 02-23-2025 at 10:00 am

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Whether EUV or DUV doesn’t matter at 20 nm pitch
The International Roadmap for Devices and Systems, 2022 Edition, indicates that the “2nm” node due in 2025 (this year) has a minimum (metal) half-pitch of 10 nm [1]. This is, in fact, less than the resolution of a current state-of-the-art EUV system, with a numerical aperture… Read More


Trump whacking CHIPS Act? When you hold the checkbook, you make up the new rules

Trump whacking CHIPS Act? When you hold the checkbook, you make up the new rules
by Robert Maire on 02-16-2025 at 10:00 am

Robert Maire Semiconductor Advisors
  • News reports that Trump will change CHIPS Act to suit his views
  • We specifically predicted this months ago as deals closed 11th hour
  • Blue states, enemies list & foreign entities likely to get cut
  • Big changes/cuts likely to a program Trump roundly criticized

Reuters: Exclusive: Trump prepares to change US CHIPS Act conditions,Read More


Intel High NA Adoption

Intel High NA Adoption
by Scotten Jones on 04-24-2024 at 6:00 pm

High NA EUV Final Pre Briefing Deck 4.15.24 embargoed til 4.18 at 7am PT (1) Page 07

On Friday April 12th Intel held a press briefing on their adoption of High NA EUV with Intel fellow and director of lithography Mark Phillips.

In 1976 Intel built Fab 4 in Oregon, the first Intel fab outside of California. With the introduction of 300mm Oregon became the only development site for Intel with large manufacturing, development,… Read More


ASML- Soft revenues & Orders – But…China 49% – Memory Improving

ASML- Soft revenues & Orders – But…China 49% – Memory Improving
by Robert Maire on 04-19-2024 at 8:00 am

Fully assembled TWINSCAN EXE 5000

ASML- better EPS but weaker revenues- 2024 recovery on track
China jumps 10% to 49%- Memory looking better @59% of orders
Order lumpiness increases with ASP- EUV will be up-DUV down
“Passing Bottom” of what has been a long down cycle

Weak revenues & orders but OK EPS

Reported revenue was Euro5.3B and EPS of Euro3.11… Read More


SPIE Let there be Light! High NA Kickoff! Samsung Slows? “Rapid” Decline?

SPIE Let there be Light! High NA Kickoff! Samsung Slows? “Rapid” Decline?
by Robert Maire on 03-03-2024 at 6:00 am

High NA EUV 2024

– High NA EUV’s coming out party – “Dawn” of the Angstrom Era
– Well attended, positive vibes, not much new but good progress
– Concerns about Samsung slowing spend while Intel accelerates
– KLA reticle inspection quandary – Risky business in China

SPIE was a High-NA
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Pinning Down an EUV Resist’s Resolution vs. Throughput

Pinning Down an EUV Resist’s Resolution vs. Throughput
by Fred Chen on 02-21-2024 at 8:00 am

Pinning Down an EUV Resist's Resolution

The majority of EUV production is on 5nm and 3nm node, implemented by late 2022. Metal oxide resists have not been brought into volume production yet [1,2], meaning that only organic chemically amplified resists (CARs) have been used instead until now. These resists have a typical absorption coefficient of 5/um [3,4], which means

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ASML – Strong order start on long road to 2025 recovery – 24 flat vs 23 – EUV shines

ASML – Strong order start on long road to 2025 recovery – 24 flat vs 23 – EUV shines
by Robert Maire on 01-26-2024 at 6:00 am

ASML Cleanroom EUV Wafer Stage Training

– ASML orders more than triple sequentially- Utilization increases
– Management remains conservative with flat revenues 2024 vs 2023
– Recovery will be slow, targeting 2025- Long & weak cyclical bottom
– Litho orders are leading indicator of future wider recovery

Strong orders pave the way for
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Is Intel cornering the market in ASML High NA tools? Not repeating EUV mistake

Is Intel cornering the market in ASML High NA tools? Not repeating EUV mistake
by Robert Maire on 12-24-2023 at 9:00 am

High NA EUV
  • Reports suggest Intel will get 6 of 10 ASML High NA tools in 2024
  • Would give Intel a huge head start over TSMC & Samsung
  • A big gamble but a potentially huge pay off
  • Does this mean $4B in High NA tool sales for ASML in 2024?

News suggests Intel will get 6 of first 10 High NA tools made by ASML in 2024

An industry news source, Trendforce, reports… Read More


SPIE- EUV & Photomask conference- Anticipating High NA- Mask Size Matters- China

SPIE- EUV & Photomask conference- Anticipating High NA- Mask Size Matters- China
by Robert Maire on 10-09-2023 at 6:00 am

Conference EUV Lithography

– SPIE EUV & Photomask conference well attended with great talks
– Chip industry focused on next gen High NA EUV & what it impacts
– Do big chips=big masks? Another Actinic tool?
– AI & chip tools, a game changer- China pre-empting more sanctions

The SPIE EUV & Photomask conference in Monterey
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