I am talking about the health of electronic and semiconductor design, which if made sound at RTL stage, can set it right for the rest of the design cycle for faster closure and also at lesser cost. Last week was the week of ITC(International Test Conference) for the Semiconductor and EDA community. I was looking forward to what ITC… Read More
Once a year Mentor has a customer appreciation event in Silicon Valley with a guest speaker on some aspect of science. This is silicon valley, after all, so we all have to be geeks. This year it was Dr Sean Carroll from CalTech on The Particle at the End of the Universe, the Hunt for The Higg’s Boson and What’s Next.
Wally … Read More
Today TSMC announced three reference flows that they have been working on along with various EDA vendors (and ARM and perhaps other IP suppliers). The three new flows are:
Designing an LTE modem is an interesting case study in architectural and system level design because it is pretty much on the limit of what is possible in a current process node such as 28nm. I talked to Johannes Stahl of Synopsys about how you would accomplish this with the Synopsys suite of system level tools. He is the first to admit… Read More
October 16[SUP]th[/SUP] at the Computer History Museum, EDAC is hosting EDA: Back to the Future to celebrate 50 years of EDA. EDAC always has a fall event of some sort and historically it has been the Kaufman Award Dinner. This year, the Kaufman Award was presented (to Chenming Hu) at 50[SUP]th[/SUP] DAC, so the fall EDAC calendar… Read More
Lately I was studying about new innovations in memory world such as ReRAM and Memristor. As DRAM (although it has become a commodity) has found its extensive use in mobile, PC, tablet and so on, that was an inclination too to know more about. While reviewing Cadence’s offering in memory subsystems, I came across this whitepaperwhich… Read More
At TSMC’s OIP on October 1st, Mentor Graphics have 5 different presentations. Collect the whole set!
11am, EDA track. Design Reliability with Calibre Smartfill and PERC. Muni Mohan of Broadcom and Jeff Wilson of Mentor. New methodologies were invented for 28nm for smart fill meeting DFM requirements (and at 20nm me may … Read More
As more people adopt high-level synthesis (HLS) they start to worry about what is the best design flow to be using. This is especially so for verification since it forms such a large part of the effort on a modern SoC. The more people rely on HLS for producing their RTL from C, the more they realize they had better do a good job of verifying… Read More
Increasingly, end users in some markets are requiring soft error rate (SER) data. This is a measure of how resistant the design (library, chip, system) is to single event effects (SEE). These manifest themselves as SEU (upset), SET (transient), SEL (latch-up), SEFI (functional interrupt).
There are two main sources that cause… Read More
Remember? During DAC2013 I talked about a new kind of innovation: A Virtual Fabrication Platform, SEMulator3D, developed by COVENTOR. Now, to my pleasant surprise, there is something to report on the proven results from this platform. IBM, in association with COVENTOR, has successfully implemented a 3D Virtual Fabrication… Read More
