Chip designers are familiar with the additional physical design checking requirements that were incorporated into flows at advanced process nodes. With the introduction of optical correction and inverse lithography technology applied during mask data generation, and with the extension of a 193nm exposure source to finer… Read More
Back in the day the Dracula tool from Cadence was king of the DRC and LVS world for physical IC verification, however more recently we’ve seen Calibre from Mentor Graphics as the leader in this realm. Cadence wanted to reclaim their earlier prominence in physical verification so they had to come out with something different… Read More
A few weeks back I wrote an article mentioning that Mentor Graphics has been quietly working on solutions for photonic integrated circuits (PICs) for some time now, while one of their competitors has recently established a photonics beachhead. One of the most common challenges for PIC designs is their curvilinear nature, thus… Read More
Every time the industry transitions to a smaller process node IC design software undergoes extensive updates.
I talked to a couple of experts in physical design at Mentor Graphics about what is involved in making place-and-route software ready for a new node. This is what I learned from Sudhakar Jilla, the IC design marketing director… Read More
After reading previous SemiWiki coverage on Dassault Systèmes and their ENOVIA Pinpoint solution, one big item seemed missing: how does this thing actually work? With all due respect to our other bloggers who covered when Dassault Systèmes acquired Pinpoint from Tuscany Design Automation, why Qualcomm is using Pinpoint, and… Read More
If you’ve followed my last article, The Guiding Light and Other Photonic Soaps, you read my comments about the use of waveguides to “guide the light” in photonic integrated circuits (PICs). This article continues the soap opera theme, this time with the Young and the Restless. My point here is that I am continually struck by the dichotomies… Read More
In the history of semiconductor design and manufacturing, the age-old concept of DRC rule-deck qualification for handshake between design and manufacturing still applies strongly to produce working silicon. In fact, DRC clean GDSII works as the de facto golden gate between a design and a foundry for manufacturing the chip for… Read More
Albert Einsteinhad said, “In the middle of difficulty lies opportunity”. In today’s world dominated by technology, or I must say internet which has initiated collaborative information sharing, “leading from the middle” is the new mantra of life.… Read More
The market demanded that gadgets it loves become ever more conscious of their power consumption, and chip designers responded with an array of clever techniques to cut IC power use. Unsurprisingly, these new techniques added to the complexity of IC verification. When you’re verifying a design that has 100+ separate power domains,… Read More
The technology for 10 nm is settled, but what about 7 nm and 5 nm? Those nodes will happen with silicon-based CMOS and 193nm immersion lithography, but exactly how is still being worked out. Right now, though, the focus is on getting 10 nm chips into high-volume production. TSMC and Intel both claim to be on track for high-volume manufacturing… Read More
