Coventor ASML IMEC: The last half nanometer

Coventor ASML IMEC: The last half nanometer
by Scotten Jones on 01-19-2016 at 4:00 pm

On Tuesday evening December 8[SUP]th[/SUP] at IEDM, Coventor held a panel discussion entitled the “The last half nanometer”. Coventor is a leading provider of simulation software used to design processes. This is my third year attending the Coventor panel discussion at IEDM and they are always excellent with very strong panels… Read More


Moore’s Law and Silicon Forest

Moore’s Law and Silicon Forest
by Daniel Payne on 11-04-2015 at 4:00 pm

When I first moved to Oregon in 1978 the largest industry was forestry, but then the endangered Spotted Owl was found and that put an end to many forestry companies and decimated the economy of many rural cities. Strangely enough it turns out that the Spotted Owl was found in great numbers across multiple states, so it never should’ve… Read More


EUV sees further delays?

EUV sees further delays?
by Robert Maire on 10-14-2015 at 12:00 pm

Headwinds which will likely continue into 2016…
ASML reported revenues of 1.55B Euros with EPS of 0.75 Euros more or less in line with expectations. Orders were the weak spot, falling to 904M Euros versus the previous Q2 orders of 1.523B Euros. The company guided Q4 revenues to be down about 10% to 1.4B Euros below current flattish… Read More


EUV – So late to the party it may already be over!

EUV – So late to the party it may already be over!
by Robert Maire on 09-29-2015 at 12:00 pm

Stocks in the semiconductor equipment space continue to fall only this time along with the broad market. We had recently pointed out that LRCX was the last to fall among the large cap companies in the space but now the question becomes when have they fallen enough to say its over, and which stocks have more to fall……

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The Future of Moore’s Law

The Future of Moore’s Law
by Daniel Payne on 09-17-2015 at 12:00 pm

I’ve lived in Silicon Valley then moved north to the Silicon Forest (aka Portland, Oregon) in 1995, and thankfully we have a lot of high-tech companies here like: Intel, Lam Research (Novellus), Lattice Semi, Qorvo, Synopsys, Mentor, Cadence, Northwest Logic, etc. There’s a global industry organization called… Read More


EUV: the view from imec

EUV: the view from imec
by Paul McLellan on 06-23-2015 at 7:00 pm

I’m at the 2015 imec technology forum (ITF) in Brussels the next few days. One of the presentations today was by Peter Wennink, the CEO of ASML. The thing that most interested me in his presentation is what the status of EUV is today. ASML is the only company developing EUV steppers so what they think is important. On the other … Read More


Extending EUV Lithography

Extending EUV Lithography
by Scotten Jones on 06-12-2015 at 1:00 pm

I have previously written about SPIE day 1 and 2 so I want to wrap up my coverage with some impressions from days 3 and 4. My single biggest take away from the conference is that EUV has made tremendous progress in the last 12 months. Last year the mood of the conference was in my opinion pessimistic with respect to EUV, this year the mood… Read More


"Cook’s Law" supersedes "Moore’s Law"-its impact on Apple, Samsung, TSMC & Intel

"Cook’s Law" supersedes "Moore’s Law"-its impact on Apple, Samsung, TSMC & Intel
by Robert Maire on 05-29-2015 at 7:00 am

Apple drives the semi industry harder than Wintel ever did: Is winning Apple’s chip business a pyrrhic victory? Is 14nm done before it starts? Too short to be profitable?

Chips marching to an Apple cadence…

In the “old days” when Wintel ruled the roost and drove the semi industry, it was driving spending
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Mapping Focus and Dose onto BEOL Fabrication Effects

Mapping Focus and Dose onto BEOL Fabrication Effects
by Tom Simon on 03-16-2015 at 7:00 pm

With today’s ArF based lithography using 193nm wavelength light, we are hard up against the limitations imposed by the Raleigh equation. Numerous clever things have been devised to maximize yield and reduce feature size. These include 2 beam lithography, multiple patterning, immersion litho processes to improve NA, thinner… Read More


ASML ASyMptotic progress- When will we get to EUV?

ASML ASyMptotic progress- When will we get to EUV?
by Robert Maire on 02-24-2015 at 5:30 pm

  • ASML making progress – but is it fast enough?
  • ASML has missed 10nm , can it catch 7nm? An economic question
  • Day one at SPIE- Better tone than last year but still cautious

1000 simulated wafers versus 700 simulated
At the opening of the SPIE conference ASML announced that TSMC had reached 1000 wafers a day “exposed”
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