Virtual Mask Solutions Seminar 2026

At advanced nodes, observed defectivity, variability, and process-window behavior increasingly extend beyond what EPE and CD metrics can characterize. Closing that gap requires new ways to model, optimize, and measure patterning as well as the GPU and AI-driven scale to deploy them on production timelines. Join Synopsys lithography experts to see what comes next.

Why Attend

• Move beyond EPE-only thinking to cost functions that are defectivity-aware, process-window driven, and topology-constrained to balance competing manufacturing goals.
• Measure what CD and registration miss — contour-based EPE analysis for curvilinear patterns, variation, OPC/ILT correction quality, and overlay.
• See GPU acceleration in production terms — faster turnaround, lower cost of ownership, and practical rigorous 3D simulation and ML-enabled modeling.
• Put agentic AI to work — Knowledge Assistants and Mask Space Optimization (MSO)that speed recipe generation, troubleshooting, and deployment.