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ASML EUV Update at SPIE

ASML EUV Update at SPIE
by Scotten Jones on 06-24-2022 at 6:00 am

12051 4 SPIE2022 Smeets 0.33 NA EUV systems for High Volume Manufacturing Page 07

At the 2022 SPIE Advanced Lithography Conference, ASML presented an update on EUV. I recently had a chance to go over the presentations with Mike Lercel of ASML. The following is a summary of our discussions.

0.33 NA

The 0.33 NA EUV systems are the production workhorse systems for leading edge lithography today. 0.33 NA systems are… Read More


TSMC 2022 Technology Symposium Review – Process Technology Development

TSMC 2022 Technology Symposium Review – Process Technology Development
by Tom Dillinger on 06-22-2022 at 5:00 am

finFLEX

TSMC recently held their annual Technology Symposium in Santa Clara, CA.  The presentations provided a comprehensive overview of their status and upcoming roadmap, covering all facets of process technology and advanced packaging development.  This article will summarize the highlights of the process technology updates… Read More


Three Key Takeaways from the 2022 TSMC Technical Symposium!

Three Key Takeaways from the 2022 TSMC Technical Symposium!
by Daniel Nenni on 06-16-2022 at 12:10 pm

TSMC Technology Roadmap 2022

The TSMC Technical Symposium is today so I wanted to give you a brief summary of what was presented. Tom Dillinger will do a more technical review as he has done in the past. I don’t want to steal his thunder but here is what I think are the key takeaways. First a brief history lesson.

The history of TSMC Technology Development with 12 keyRead More


Intel 4 Deep Dive

Intel 4 Deep Dive
by Scotten Jones on 06-13-2022 at 6:00 am

Figure 1

As I previously wrote about here, Intel is presenting their Intel 4 process at the VLSI Technology conference. Last Wednesday Bernhard Sell (Ben) from Intel gave the press a briefing on the process and provided us with early access to the paper (embargoed until Sunday 6/12).

“Intel 4 CMOS Technology Featuring Advanced FinFET TransistorsRead More


WEBINAR: 5G is moving to a new and Open Platform O-RAN or Open Radio Access Network

WEBINAR: 5G is moving to a new and Open Platform O-RAN or Open Radio Access Network
by Daniel Nenni on 06-10-2022 at 6:00 am

The demands of 5G requires new designs to not only save power but also increase performance and by moving to advance power-saving nodes and by using eFPGAs will help to achieve these goals. This paper will introduce 5G and O-RAN, the complexity of these systems, and how flexibility could be beneficial. Then we will dive into how eFPGA… Read More


An Update on In-Line Wafer Inspection Technology

An Update on In-Line Wafer Inspection Technology
by Tom Dillinger on 06-06-2022 at 6:00 am

inspection overview

From initial process technology development (TD) to high volume manufacturing (HVM) status for a new node, one of the key support functions to improve and maintain yield is the in-line wafer inspection technology.  Actually, there are multiple inspection technologies commonly employed, with tradeoffs in pixel resolution,… Read More


Leveraging Simulation to Accelerate the Design of Plasma Reactors for Semiconductor Etching Processes

Leveraging Simulation to Accelerate the Design of Plasma Reactors for Semiconductor Etching Processes
by Kalar Rajendiran on 06-03-2022 at 6:00 am

Etching Processes

There is no shortage of reporting on the many technological advances happening within the semiconductor industry. But sometimes it feels like we hear less in the area of semiconductor manufacturing equipment than in the design and product arenas. That doesn’t mean that there is less happening there or what is happening there … Read More


Inverse Lithography Technology – A Status Update from TSMC

Inverse Lithography Technology – A Status Update from TSMC
by Tom Dillinger on 06-02-2022 at 6:00 am

ILT mask rules

“Inverse lithography technology (ILT) represents the most significant EDA advance in the last two decades.”  Danping Peng from TSMC made that assertion at the recent SPIE Advanced Lithography + Patterning Conference, in his talk entitled:  ILT for HVM:  History, Present, and Future.  This article summarizes the highlights… Read More


Unlock first-time-right complex photonic integrated circuits

Unlock first-time-right complex photonic integrated circuits
by Raha Vafaei on 06-01-2022 at 10:00 am

EPDA overview

The capacity and energy efficiency challenges from the growing appetite for high-speed data along with advanced applications such as LIDAR and quantum computing are driving demand for increasingly large-scale photonic integrated circuits (PIC). With an ever-increasing number of components on a single photonic chip, manual… Read More


0.55 High-NA Lithography Update

0.55 High-NA Lithography Update
by Tom Dillinger on 05-31-2022 at 6:00 am

mask infrastructure 0 55

At the recent SPIE Advanced Lithography + Patterning Conference, Mark Phillips from Intel gave an insightful update on the status of the introduction of the 0.55 high numerical aperture extreme ultraviolet lithography technology.  Mark went so far as to assert that the development progress toward high-NA EUV would support … Read More