A Simple, Scalable LDE Optimization Flow for 28/20nm Custom/AMS Design

A Simple, Scalable LDE Optimization Flow for 28/20nm Custom/AMS Design
by Eric Filseth on 04-29-2012 at 9:00 pm

At 28nm and below, a number of electrical variation effects become significant which depend not only on individual devices, but the physical interaction between neighboring devices, wells, etc during the manufacturing process. Some of these effects have become collectively referred to as “Layout Dependent Effects” (LDE);… Read More