Solido & TSMC Variation Webinar for Optimal Yield in Memory, Analog, Custom Digital Design

Solido & TSMC Variation Webinar for Optimal Yield in Memory, Analog, Custom Digital Design
by Daniel Nenni on 10-09-2011 at 4:01 pm

Solido has announced webinars for North America, Europe and Asia on October 12-13. They will be describing the variation analysis and design solutions in the TSMC AMS Reference Flow 2.0 announced at the Design Automation Conference this year.

“We are pleased to broaden our collaboration with Solido in developing advanced variation… Read More


PVT and Statistical Design in Nanometer Process Geometries

PVT and Statistical Design in Nanometer Process Geometries
by Daniel Nenni on 09-18-2011 at 9:00 am

On Sept 22, 2011, the nm Circuit Verification Forumwill be held in Silicon Valley, hosted by Berkeley Design Automation. At this forum, Trent McConaghy of Solido DA will present a case study on the TSMC Reference Flow 2.0 VCO circuit, to showcase Fast PVT in the steps of extracting PVT corners, verifying PVT, and doing post-layout… Read More


Semiconductor Yield @ 28nm HKMG!

Semiconductor Yield @ 28nm HKMG!
by Daniel Nenni on 08-28-2011 at 4:00 pm

Whether you use a gate-first or gate-last High-k Metal Gate implementation, yield will be your #1 concern at 28nm, which makes variation analysis and verification a big challenge. One of the consulting projects I have been working on with the foundries and top fabless semiconductor companies is High-Sigma Monte Carlo (HSMC) … Read More


Solido – Variation Analysis and Design Software for Custom ICs

Solido – Variation Analysis and Design Software for Custom ICs
by Daniel Payne on 08-15-2011 at 7:11 pm

Introduction
When I designed DRAM chips at Intel I wanted to simulate at the worst case process corners to help make my design as robust as possible in order to improve yields. My manager knew what the worst case corners were based on years of prior experience, so that’s what I used for my circuit simulations.… Read More