Mentor at the TSMC Open Innovation Platform Ecosystem Forum

Mentor at the TSMC Open Innovation Platform Ecosystem Forum
by Daniel Payne on 10-17-2011 at 3:14 pm

EDA companies and foundries must closely collaborate in order to deliver IC tool flows that work without surprises at the 40nm and 28nm nodes.

Tomorrow in San Jose
you can attend this 4th annual event hosted by TSMC along with Mentor Graphics and other EDA and IP companies.

Here are some of the topics that will interest IC designers… Read More


A New Name: ‘Si2Con’ Arrives October 20th!

A New Name: ‘Si2Con’ Arrives October 20th!
by Daniel Nenni on 10-11-2011 at 7:58 pm

In case you have not heard, the 16th Si2-hosted conference highlighting industry progress in design flow interoperability comes to Silicon Valley (Santa Clara, CA) on October 20th. Si2Con will showcase recent progress of members in the critical areas of:

[LIST=1]

  • Design tool flow integration (OpenAccess)
  • DRC / DFM / Parasitics
  • Read More

    Mask and Optical Models–Evolution of Lithography Process Models, Part IV

    Mask and Optical Models–Evolution of Lithography Process Models, Part IV
    by Beth Martin on 10-10-2011 at 4:50 pm

    Will Rogers said that an economist’s guess is liable to be as good as anyone’s, but with advanced-node optical lithography, I might have to disagree. Unlike the fickle economy, the distorting effects of the mask and lithographic system are ruled by physics, and so can be modeled.

    In this installment, I’ll talk about two critical… Read More


    Memory Cell Characterization with a Fast 3D Field Solver

    Memory Cell Characterization with a Fast 3D Field Solver
    by Daniel Payne on 09-29-2011 at 12:07 pm

    Memory designers need to predict the timing, current and power of their designs with high accuracy before tape-out to ensure that all the design goals will be met. Extracting the parasitic values from the IC layout and then running circuit simulation is a trusted methodology however the accuracy of the results ultimately depend… Read More


    Samsung versus Apple and TSMC!

    Samsung versus Apple and TSMC!
    by Daniel Nenni on 09-28-2011 at 6:56 am

    Apple will purchase close to eightBILLION dollars in parts from Samsung for the iSeries of products this year alone, making Apple Samsung’s largest customer. Samsung is also Apple’s largest competitor and TSMC’s most viable competitive foundry threat so it was no surprise to see Apple and TSMC team up on the next generations of… Read More


    Semiconductor equipment spending beginning to decline

    Semiconductor equipment spending beginning to decline
    by Bill Jewell on 09-25-2011 at 7:41 pm

    Semiconductor manufacturing equipment shipments have leveled off after a strong rebound from the 2008-2009 downturn. August 2011 three-month-average shipments based on combined data from SEMI (North American and European companies) and SEAJ (Japanese companies) were $2.9 billion, down from a peak of $3.2 billion in May Read More


    Nanometer Circuit Verification: The Catch-22 of Layout!

    Nanometer Circuit Verification: The Catch-22 of Layout!
    by Daniel Nenni on 09-19-2011 at 8:00 pm

    As analog and mixed-signal designers move to very advanced geometries, they must grapple with more and more complex considerations of the silicon. Not only do nanometer CMOS devices have limitations in terms of analog-relevant characteristics such gain and noise performance, but they also introduce new sources of variation… Read More


    Fast Track Seminars

    Fast Track Seminars
    by Paul McLellan on 09-15-2011 at 6:11 pm


    Atrenta’s SoC realization seminars, “Fast Track Your SoC Design” have started.The first one was in Ottowa last Tuesday, and it was a full house. In a straw poll, most of the attendees acknowledged facing IP handoff and quality issues. The keynote speaker was Dr Yuejian Wu, director of ASIC development at Infinera… Read More


    When analog/RF/mixed-signal IC design meets nanometer CMOS geometries!

    When analog/RF/mixed-signal IC design meets nanometer CMOS geometries!
    by Daniel Nenni on 09-13-2011 at 9:22 am

    In working with TSMC and GlobalFoundries on AMS design reference flows I have experienced first hand the increasing verification challenges of nanometer analog, RF, and mixed-signal circuits. Tools in this area have to be both silicon accurate and blindingly fast! Berkeley Design Automation is one of the key vendors in this … Read More


    2.5D and 3D designs

    2.5D and 3D designs
    by Paul McLellan on 09-07-2011 at 1:54 pm

    Going up! Power and performance issues, along with manufacturing yield issues, limit how much bigger chips can get in two dimensions. That, and the fact that you can’t manufacture two different processes on the same wafer, mean that we are going up into the third dimension.

    The simplest way is what is called package-in-package… Read More