Layout Pattern Matching for DRC, DFM, and Yield Improvement

Layout Pattern Matching for DRC, DFM, and Yield Improvement
by Tom Dillinger on 06-01-2016 at 12:00 pm

It is truly amazing to consider the advances in microelectronic process development, using 193i photolithography. The figure below is a stark reminder of the difference between the illuminating wavelength and the final imaged geometries. This technology evolution has been enabled by continued investment in mask data generation… Read More


Process Variation is a Yield Killer!

Process Variation is a Yield Killer!
by Daniel Nenni on 09-20-2013 at 11:00 am

With the insatiable wafer appetites of the fabless semiconductor companies in the mobile space, yield has never been more critical. The result being better EDA tools every year and this blog highlights one of the many examples. It has been a pleasure writing about Solido Design Automation and seeing them succeed amongst the foundries… Read More


GLOBALFOUNDRIES and Mentor Develop Methods to Identify Critical Features in IC Designs

GLOBALFOUNDRIES and Mentor Develop Methods to Identify Critical Features in IC Designs
by glforte on 11-28-2012 at 3:00 pm

Since the beginning of the semiconductor industry, improving the rate of yield learning has been a critical factor in the success silicon manufacturing. Each fab has dedicated yield teams that look at the yield of wafers manufactured the previous day and attempt to find the root cause of any unexpected “excursions.” In earlier… Read More


TSMC 28nm Yield Explained!

TSMC 28nm Yield Explained!
by Daniel Nenni on 03-04-2012 at 4:00 pm


Yield, no topic is more important to the semiconductor ecosystem. After spending a significant part of my career on Design for Manufacturability (DFM) and Design for Yield (DFY), I’m seriously offended when semiconductor professionals make false and misleading statements that negatively affects the industry that Read More