Most simple testbenches have close to no structure, are terrible to modify and hopeless to understand. They often take far too much time to implement and provide close to no support when debugging potential problems. This webinar will demonstrate how to build a far better testbench with respect to all these issues – in significantly… Read More
April 25, 2013, San Jose, CA
Click here to register.
Come hear Mentor Graphics CEO, Wally Rhines, 2013 Kaufman Award Winner,Chenming Hu, and Xilinx Senior VP,Victor Peng, at the User2User Conference in San Jose.
KEYNOTES
Organizing by Design
9:00am – 9:50am
Walden C. Rhines | CEO & Chairman | Mentor Graphics
Winning products… Read More
In EDA we often talk about how fast a SPICE circuit simulator is, or about capacity and accuracy compared to silicon measurements. Yes, speed, capacity and accuracy are important, however when talking to actual transistor-level circuit designers you discover something quite different, most of their time is spent doing debugging,… Read More
TSMC will host their annual technology symposium at several locations in the U.S. on April 9th in San Jose, April 16th in Austin, and April 23rd in Boston. TSMC will discuss the market outlook, design enablement, and technology for high-speed computing, mobile communications, connectivity and storage, CIS, embedded flash, … Read More
This year’s Mentor Graphics user group meeting, User2User, will be held at the DoubleTree by Hilton in San Jose, California on April 25, 2013. The featured keynote presenters include…
My first job out of college was doing transistor-level circuit design, so I’m always curious about how companies are doing billion-transistor chip design and debug these days at the FPGA companies.
I spoke with Yaron Kretchmer,he works at Altera and manages the engineering infrastructure group where they have a compute… Read More
TSMC and Synopsys hosted a webinar in December on this topic of double patterning and how it impacts the IC extraction flow. The 20nm process node has IC layout geometries so closely spaced that the traditional optical-based lithography cannot be used, instead lower layers like Poly and Metal 1 require a new approach of using two… Read More
We will soon start to see the quarterly financial reporting installments of the “Big 3” public EDA companies. I predict they will be as boring as usual. I am not sure if I would want it any differently though.
Back in the 90s there were times when it was truly interesting to wait to see what Cadence, Mentor, or later Synopsys, might announce.… Read More
IC designers using advanced nodes are acutely aware of how variation effects in the silicon itself are causing increased analysis and design efforts in order to yield chips at acceptable levels. Four authors from Solidoare so passionate about this topic that they combined their years of experience into a book that I had a chance… Read More
D&R IP-SoC Days Santa Clara will be held on April 10, 2012 in Santa Clara, CA and if you plan to attend, just register here. IP market is a small world, and EDA a small market if you look at the generated revenue… but both are essential building blocks for the semiconductor industry. It was not clear back in 1995 that IP will become … Read More
