EUV (Extreme UltraViolet) lithography has received attention within the semiconductor industry since its development inception in 1997 with the formation of the EUV LLC [1], and more recently, since the 7nm node began, with limited use by Samsung and TSMC being touted as key advantages [2, 3]. As with any key critical technology,
SPIE Photomask Technology + Extreme Ultraviolet Lithography
Make plans for the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection and repair, mask business, extreme UV lithography, and emerging technologies.
Present your research in Monterey, 29 September – 3 October 2024. Call for papers opens in January