Tag: photomask

SPIE Photomask Technology + Extreme Ultraviolet Lithography

SPIE Photomask Technology + Extreme Ultraviolet Lithography
by Admin on 06-16-2026 at 2:07 pm

Join your colleagues in Monterey for the premier worldwide photomask conference

We invite you to explore the latest advances and breakthroughs at this annual conference in Monterey, California. Connect with leading scientists and engineers and discover new work across photomasks, patterning, metrology, materials, inspection

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The Uncertain Phase Shifts of EUV Masks

The Uncertain Phase Shifts of EUV Masks
by Fred Chen on 05-13-2020 at 10:00 am
Categories: Lithography
1 Comment

The Uncertain Phase Shifts of EUV Masks

EUV (Extreme UltraViolet) lithography has received attention within the semiconductor industry since its development inception in 1997 with the formation of the EUV LLC [1], and more recently, since the 7nm node began, with limited use by Samsung and TSMC being touted as key advantages [2, 3]. As with any key critical technology,

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It’s a 14nm photomask, what could possibly go wrong?

It’s a 14nm photomask, what could possibly go wrong?
by Don Dingee on 08-27-2013 at 3:16 pm
Categories: EDA, Siemens EDA

Let’s start with the bottom line: in 14nm processes, errors which have typically been little more than noise with respect to photomask critical dimension (CD) control targets at larger process nodes are about to become very significant, even out of control if not accounted for.… Read More