EUV (Extreme UltraViolet) lithography has received attention within the semiconductor industry since its development inception in 1997 with the formation of the EUV LLC [1], and more recently, since the 7nm node began, with limited use by Samsung and TSMC being touted as key advantages [2, 3]. As with any key critical technology,
Photomask Japan 2021
PMJ2021 will be held as a Digital Forum from April 20(Tue.) to 21(Wed.).
- Author Guidelines (SPIE Proceedings Manuscript) are available. [Feb. 5, 2021]
- 3rd Announcement is available. [Feb. 5, 2021]
- Registration is now available. [Feb. 1, 2021]
- Program at a Glance is available. [Jan. 26, 2021]
- Symposium period has been updated.