GaN Device Design and Optimization with TCAD

GaN Device Design and Optimization with TCAD
by Daniel Payne on 10-07-2025 at 10:00 am

GaN Power, Frequency min

I’ve read articles about power electronics, RF systems and high-frequency applications using SiC and GaN transistors, especially in EVs and chargers, but hadn’t looked into the details of GaN devices. A recent Silvaco webinar proved to be just the format that I needed to learn more about GaN design and optimization. Udita Mittal,… Read More


Advancements in High-Density Front- and Backside Wafer Connectivity: Paving the Way for CMOS 2.0

Advancements in High-Density Front- and Backside Wafer Connectivity: Paving the Way for CMOS 2.0
by Admin on 08-30-2025 at 6:00 am

Example of a possible partitioning of a SoC in the CMOS 2.0 era

In the rapidly evolving semiconductor landscape, imec’s recent breakthroughs in wafer-to-wafer hybrid bonding and backside technologies are reshaping the future of compute systems. As detailed in their article, these innovations transition CMOS 2.0 from a conceptual framework to practical reality, enabling denser,… Read More


TCAD for 3D Silicon Simulation

TCAD for 3D Silicon Simulation
by Daniel Payne on 06-03-2025 at 10:00 am

Silvaco TCAD min

Semiconductor fabs aim to have high yields and provide processes that attract design firms and win new design starts, but how does a fab deliver their process nodes in a timely manner without having to run lots of expensive silicon through the line? This is where simulation and TCAD tools come into play, and to learn more about this… Read More


Design-Technology Co-Optimization (DTCO) Accelerates Market Readiness of Angstrom-Scale Process Technologies

Design-Technology Co-Optimization (DTCO) Accelerates Market Readiness of Angstrom-Scale Process Technologies
by Kalar Rajendiran on 05-28-2025 at 10:00 am

Sassine Holding an 18A Test chip

Design-Technology Co-Optimization (DTCO) has been a foundational concept in semiconductor engineering for years. So, when Synopsys referenced DTCO in their April 2025 press release about enabling Angstrom-scale chip designs on Intel’s 18A and 18A-P process technologies, it may have sounded familiar—almost expected. … Read More


Intel Foundry Delivers!

Intel Foundry Delivers!
by Daniel Nenni on 05-05-2025 at 10:00 am

Intel Foundry Direct Connect Hall 4 1024x576

Now that the dust has settled, I will give you my take on the Intel Foundry event. Some might call me a semiconductor event critic as I have attended hundreds of them over the last 40 years starting with the Design Automation Conference in 1984. Foundry events are my favorite because they really are the pulse of the semiconductor industry,… Read More


SPIE 2023 Buzz – Siemens Aims to Break Down Innovation Barriers by Extending Design Technology Co-Optimization

SPIE 2023 Buzz – Siemens Aims to Break Down Innovation Barriers by Extending Design Technology Co-Optimization
by Mike Gianfagna on 12-26-2023 at 6:00 am

SPIE 2023 Buzz – Siemens Aims to Break Down Innovation Barriers by Extending Design Technology Co Optimization

Preventing the propagation of systematic defects in today’s semiconductor design-to-fabrication process requires many validation, analysis and optimization steps. Tools involved in this process can include design rule checking (DRC), optical proximity correction (OPC) verification, mask writing and wafer printing… Read More


Semiconductor Devices: 3 Tricks to Device Innovation

Semiconductor Devices: 3 Tricks to Device Innovation
by Milind Welling on 09-22-2023 at 8:00 am

Semiconductor Devices 3 Tricks to Device Innovation 1

The semiconductor industry’s incredible juggernaut has been powered by device innovations at its very core. Moreover, present-day enterprises encounter immense competitive pressures and innovations are a key differentiator to maintain their competitive edge1.

“It wasn’t that Microsoft was so brilliant or cleverRead More


IEDM 2022 – Imec 4 Track Cell

IEDM 2022 – Imec 4 Track Cell
by Scotten Jones on 01-18-2023 at 6:00 am

2022 IEDM Presentation Session23 2 VictorVega Page 03

At the IEDM conference in December 2022, Imec presented “Semi-damascene Integration of a 2-layer MOL VHV Scaling Booster to Enable 4-track Standard Cells,” I had a chance to not only read the paper and see it presented, but also to interview one of the authors Zsolt Tokie.

Logic designs are built up by standard cells such as inverters,… Read More


Design Technology Co-Optimization for TSMC’s N3HPC Process

Design Technology Co-Optimization for TSMC’s N3HPC Process
by Tom Dillinger on 11-02-2021 at 8:00 am

N3HPC performance comparison

TSMC recently held their 10th annual Open Innovation Platform (OIP) Ecosystem Forum.  An earlier article summarized the highlights of the keynote presentation from L.C. Lu, TSMC Fellow and Vice-President, Design and Technology Platform, entitled “TSMC and Its Ecosystem for Innovation” (link).

One of the topics that L.C. … Read More


Technology Optimization for Magnetoresistive RAM (STT-MRAM)

Technology Optimization for Magnetoresistive RAM (STT-MRAM)
by Tom Dillinger on 01-06-2021 at 6:00 am

profile simulations

Spin-transfer torque magnetoresistive RAM (STT-MRAM) has emerged from several foundries as a very attractive IP option.  An introduction to MRAM technology from GLOBALFOUNDRIES was provided in this earlier SemiWiki article. [1]

Briefly, STT-MRAM is a non-volatile storage option with the following attractive characteristics… Read More