Why Glass Substrates?

Why Glass Substrates?
by Sharada Yeluri on 08-13-2024 at 6:00 am

Intel Glass Substrates

The demand for high-performance and sustainable computing and networking silicon for AI has undoubtedly increased R&D dollars and the pace of innovation in semiconductor technology. With Moore’s Law slowing down at the chip level, there is a desire to pack as many chiplets as possible inside ASIC packages and get … Read More


Synopsys-AMD Webinar: Advancing 3DIC Design Through Next-Generation Solutions

Synopsys-AMD Webinar: Advancing 3DIC Design Through Next-Generation Solutions
by Kalar Rajendiran on 06-13-2024 at 10:00 am

The Synopsys Multi Die Solution

Introduction of 2.5D and 3D multi-die based products are helping extend the boundaries of Moore’s Law, overcoming limitations in speed and capacity for high-end computational tasks. In spite of its critical function within the 3DIC paradigm, the interposer die’s role and related challenges are often neither fully comprehended… Read More


3DIC Verification Methodologies for Advanced Semiconductor ICs

3DIC Verification Methodologies for Advanced Semiconductor ICs
by Kalar Rajendiran on 06-06-2024 at 10:00 am

3DIC Flow Challenges

At the recent User2user conference, Amit Kumar, Principal Hardware Engineer, Microsoft, shared the company’s experience from building a 3DIC SoC and highlighted Siemens EDA tools that were used. The following is a synthesis of core aspects of that talk.

3DIC Challenges

Despite the numerous advantages of 3DIC technology, its… Read More


Mastering Copper TSV Fill Part 2 of 3

Mastering Copper TSV Fill Part 2 of 3
by John Ghekiere on 05-29-2024 at 8:00 am

Mastering Copper TSV Fill Part 2 of 3

Establishing void-free fill of high aspect ratio TSVs, capped by a thin and uniform bulk layer optimized for removal by CMP, means fully optimizing each of a series of critical phases. As we will see in this 3-part series, the conditions governing outcomes for each phase vary greatly, and the complexity of interacting factors means… Read More


Mastering Copper TSV Fill Part 1 of 3

Mastering Copper TSV Fill Part 1 of 3
by John Ghekiere on 05-22-2024 at 8:00 am

Mastering Copper TSV Fill Part 1 of 3

Establishing void-free fill of high aspect ratio TSVs, capped by a thin and uniform bulk layer optimized for removal by CMP, means fully optimizing each of a series of critical phases. As we will see in this 3-part series, the conditions governing outcomes for each phase vary greatly, and the complexity of interacting factors means… Read More


Enabling Imagination: Siemens’ Integrated Approach to System Design

Enabling Imagination: Siemens’ Integrated Approach to System Design
by Kalar Rajendiran on 04-30-2024 at 6:00 am

Siemens EDA Important to Siemens

In today’s rapidly advancing technological landscape, semiconductors are at the heart of innovation across diverse industries such as automotive, healthcare, telecommunications, and consumer electronics. As a leader in technology and engineering, Siemens plays a pivotal role in empowering the next generation … Read More


A Game-Changer for IP Designers: Design Stage Verification

A Game-Changer for IP Designers: Design Stage Verification
by Kalar Rajendiran on 03-04-2024 at 10:00 am

Calibre Shift Left Solutions Enable Reducing TTM

In today’s rapidly evolving semiconductor industry, the design and integration of intellectual property (IP) play a pivotal role in achieving competitive advantage and market success. Whether sourced from commercial IP providers or developed in-house, ensuring that IP designs are compliant with signoff requirements… Read More


Successful 3DIC design requires an integrated approach

Successful 3DIC design requires an integrated approach
by Kalar Rajendiran on 11-13-2023 at 6:00 am

Siemens EDA 3DIC Graphics

While the leap from traditional SoC/IC designs to Three-Dimensional Integrated Circuits (3DICs) designs brings new benefits and opportunities, it also introduces new challenges. The benefits include performance, power efficiency, footprint reduction and cost savings. The challenges span design, verification, thermal… Read More


Keynote Speakers Announced for IDEAS 2023 Digital Forum

Keynote Speakers Announced for IDEAS 2023 Digital Forum
by Daniel Nenni on 10-26-2023 at 10:00 am

ideas 400X400

As we all know, hearing directly from the people who actually use EDA tools, people who are solving real world problems with the latest technologies are the best source of information. Thus EDA User group meetings are always first on my event list every year which brings us to Ansys Ideas.

Ansys User Group Meeting Features Technical

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Chiplet Q&A with Henry Sheng of Synopsys

Chiplet Q&A with Henry Sheng of Synopsys
by Daniel Nenni on 05-05-2023 at 6:00 am

SNUG Panel

At the recent Synopsys Users Group Meeting (SNUG) I had the honor of leading a panel of experts on the topic of chiplets. One of those panelists was the very personable Dr. Henry Sheng, Group Director of R&D in the EDA Group at Synopsys. Henry currently leads engineering for 3DIC, advanced technology and visualization.

Are we
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