For many year 2D NAND drove lithography for the semiconductor industry with the smallest printed dimensions and yearly shrinks. As 2D NAND shrunk down to the mid-teens nodes, 16nm, 15nm and even 14nm, the cells became so small that there were only a few electrons in each cell and cross-talk issues made further shrinks very difficult… Read More
For more than a decade 2D NAND has been the leading driver of lithography shrinks, for example, Samsung went from 120nm in 2003 to 16nm in 2014 with shrinks on an almost yearly basis, but the shrinks came at a price. At 16nm Self Aligned Quadruple Pattering (SAQP) was required for the most critical layers and patterning related costs… Read More
At IEDM IMEC presented “MOCVD In[SUB]1-x[/SUB]Ga[SUB]x[/SUB]As high mobility channel for 3-D NAND Memory” authored by E. Capogreco, J. G. Lisoni, A. Arreghini, A. Subirats, B. Kunert, W. Guo, T. Maurice, C.-L. Tan, R. Degraeve, K. De Meyer, G. Van den bosch, and J. Van Houdt.
On December 15[SUP]th[/SUP] I had the opportunity … Read More