Semiwiki 400x100 1 final
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Speeding SoC timing closure

Speeding SoC timing closure
by Paul McLellan on 01-12-2012 at 1:42 am

As chips have become larger, one of the more challenging steps is full-chip signoff. Lots of other steps in the design process can work on just a part of the problem, but by definition full-chip signoff has to work on the full chip. But it is not just that chips have got larger, the number of corners that need to be validated has also exploded.… Read More


Imera Virtual Fabric

Imera Virtual Fabric
by Paul McLellan on 01-10-2012 at 6:00 am

Virtual fabric sounds like something that would be good for making the emperor’s new clothes. I talked today to Les Spruiell of Imera to find out what it really is.

Anyone who has worked as either a designer or as an EDA engineer has had the problem of a customer who has a problem but can’t send you the design since it is (a)… Read More


Synopsys, the first 25 years

Synopsys, the first 25 years
by Paul McLellan on 01-08-2012 at 8:00 pm

Synopsys was started in 1986 and so 2011 was its 25th anniversary. They created a little timeline with some of their history. As with most companies, the earlier history is the most interesting, before it was clear what the future would bring. From 1986 to 1990 they grew to $22M in revenue, which was explosive growth. So explosive … Read More


VLSI 2012 in Hyderabad

VLSI 2012 in Hyderabad
by Paul McLellan on 01-06-2012 at 3:59 pm

Atrenta will be on a panel session at VLSI 2012 next week in Hyderabad in the center of India. Since I had a development group there over a decade ago this is actually one of the few cities in India that I have visited. Beautiful but very hot at the time I was there.

Atrenta will be represented by Sathyam Pattanam the director of engineering… Read More


EDA Vendors Providing Secure Remote Support for an IC Design Flow

EDA Vendors Providing Secure Remote Support for an IC Design Flow
by Daniel Payne on 01-05-2012 at 5:38 pm

In my last corporate EDA job I had customers in Korea that were evaluating a new circuit simulator and getting strange results. When I asked, “Could you send me your test case?” the reply was always, “No, we cannot let any of our IC design data leave the building because of security concerns.”… Read More


What Will 2012 Bring The Semiconductor Ecosystem?

What Will 2012 Bring The Semiconductor Ecosystem?
by Daniel Nenni on 12-18-2011 at 4:30 pm

During my annual holiday meal with one of my favorite EDA icons some rather bold predictions were made. On his side it was more of what he would LIKE to see happen, on my side it was more of what will HAVE to happen for the semiconductor ecosystem to thrive in the coming years.

Mike Gianfagna (Viva Italia!) spent 15+ years with RCA/GE Semiconductor… Read More


Clock Design for SOCs with Lower Power and Better Specs

Clock Design for SOCs with Lower Power and Better Specs
by Daniel Payne on 12-15-2011 at 5:03 pm

Dan Ganousis posted in our SemiWiki forums about a newer technique to lower the power consumed by GHz clocks on SOC designs and asked if I was interested to learn more, so we met today via WebEx. Dan is with a company called Cyclos Semiconductor, co-founded in 2006 by Marios Papaefthymiou, President and Alexander Ishii, VP of Engineering.… Read More


MEMS layout and automation

MEMS layout and automation
by Daniel Payne on 12-14-2011 at 11:12 am

At a webinar today I listened and learned about how a tool called L-Edit can be used to layout MEMS designs plus automate the task to be more productive. I can see how the history of IC layout editing is now being repeated with MEMS because in the earliest IC layout tools we could only do manual entry of polygons, then gradually we got cells… Read More


iLVS: Improving LVS Usability at Advanced Nodes

iLVS: Improving LVS Usability at Advanced Nodes
by glforte on 12-13-2011 at 4:54 pm

LVS Challenges at Advanced Nodes

Accurate, comprehensive device recognition, connectivity extraction, netlist generation and, ultimately, circuit comparison becomes more complex with each new process generation. As the number of layers and layer derivations increases the complexity of devices, especially Layout Dependent… Read More