The relentless miniaturization of semiconductor devices has always relied on achieving ever-smaller features on silicon wafers. However, as the industry enters the realm of extreme ultraviolet (EUV) lithography, it faces a critical barrier: stochastics, or the inherent randomness in patterning at atomic scales. This phenomenon… Read More
It is now time for the EUV community to realize they are caught between the proverbial Scylla and Charybdis. In Greek mythology, the two monsters terrorized ships that were unlucky enough to pass between them. By avoiding one, you approached the other.
Scylla was a former beautiful nymph turned into
Extreme ultraviolet (EUV) lithography targets sub-20 nm resolution using a wavelength range of ~13.3-13.7 nm (with some light including DUV outside this band as well) and a reflective ring-field optics system. ASML has been refining the EUV tool platform, starting with the NXE:3300B, the very first platform with a numerical
