## Where Are EUV Doses Headed?

by Fred Chen on 10-11-2022 at 6:00 am

In spite of increasing usage of EUV lithography, stochastic defects have not gone away. What’s becoming clearer is that EUV doses must be managed to minimize the impact from such defects. The 2022 edition of the International Roadmap for Devices and Systems has updated its Lithography portion [1]. An upward trend with decreasing… Read More

## The Complexities of the Resolution Limits of Advanced Lithography

The Complexities of the Resolution Limits of Advanced Lithography
by Fred Chen on 01-10-2021 at 6:00 am

For advanced lithography used to shrink semiconductor device features according to Moore’s Law, resolution limits are an obvious consideration. It is often perceived that the resolution limit is simply derived from a well-defined equation, but nothing can be further from the truth.