Achieving Optimal PPA at Placement and Carrying it Through to Signoff

Achieving Optimal PPA at Placement and Carrying it Through to Signoff
by Kalar Rajendiran on 05-02-2023 at 10:00 am

PreRoute PostRoute Net Length Correlation

Performance, Power and Area (PPA) metrics are the driving force in the semiconductor market and impact all electronic products that are developed. PPA tradeoff decisions are not engineering decisions, but rather business decisions made by product companies as they decide to enter target end markets. As such, the sooner a company… Read More


Calibre DFM Adds Bidirectional DEF Integration

Calibre DFM Adds Bidirectional DEF Integration
by Tom Simon on 01-26-2021 at 6:00 am

Siemens EDA DFM flow

GDS and LEF/DEF each came about to support data exchange in different types of design flows, custom layout and place & route respectively. GDS (or stream format) was first created in the late 1970s to support the first generation of custom IC layout tools, such as Calma’s GDSII system. Of course, the GDS format has been updated… Read More


Qualcomm Attests Benefits of Mentor’s RealTime DRC for P&R

Qualcomm Attests Benefits of Mentor’s RealTime DRC for P&R
by Tom Simon on 01-31-2019 at 7:00 am

When floor planning (FP) and place & route (P&R) tools took over from custom layout tools for standard cell based designs, life became a lot better for designers of large digital chips. The beauty of the new flows was that all the internals of the standard cells and many IP blocks were hidden from view, lightening the load … Read More


Cadence’s New Implementation System Promises Better TAT and PPA

Cadence’s New Implementation System Promises Better TAT and PPA
by Tom Simon on 03-12-2015 at 1:00 am

On Tuesday Cadence made a big announcement about their new physical implementation offering, Innovus, during the keynote address at the CDNLive event in Silicon Valley. Cadence CEO Lip-Bu Tan alluded to it during his kick off talk, and next up Anirudh Devgan, Senior Vice President, Digital & Signoff Group, filled in more … Read More


FinFET & Multi-patterning Need Special P&R Handling

FinFET & Multi-patterning Need Special P&R Handling
by Pawan Fangaria on 04-28-2014 at 1:00 pm

I think by now a lot has been said about the necessity of multi-patterning at advanced technology nodes with extremely low feature size such as 20nm, because lithography using 193nm wavelength of light makes printing and manufacturing of semiconductor design very difficult. The multi-patterning is a novel semiconductor manufacturing… Read More


Expert Constraint Management Leads to Productivity & Faster Convergence

Expert Constraint Management Leads to Productivity & Faster Convergence
by Pawan Fangaria on 04-12-2014 at 7:30 am

The SoC designs of today are much more complex than ever in terms of number of clocks, IPs, levels of hierarchies, several modes of operations, different types of validations and checks for growing number of constraints at various stages in the design flow. As a semiconductor design evolves through several stages from RTL to layout,… Read More


Macro Placement Challenges

Macro Placement Challenges
by Paul McLellan on 12-27-2013 at 7:28 pm

One of the challenges of physical design of a modern SoC is that of macro placement. Back when a design just had a few macros then the flooplanning could be handled largely manually. But modern SoCs suffer from a number of problems. A new white paper from Mentor covers Olympus-SOCs features to address these issues:

  • As we move to smaller
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Analog Constraint Standards

Analog Constraint Standards
by Paul McLellan on 09-20-2011 at 8:00 am

Over the years there has been a lot of standard creation in the IC design world to allow interoperability of tools from different vendors. One area of recent interest is interoperable constraints for custom IC design. Increasingly, analog design layout is becoming more automated. Advanced process nodes require trial layouts… Read More