Mentor Investigates Using Neural Networks for CMP Modeling

Mentor Investigates Using Neural Networks for CMP Modeling
by Mitch Heins on 01-12-2018 at 12:00 pm

I recently read a new white paper release by Mentor, a Siemens Business, that delved into the intricacies of Chemical Mechanical Polishing (CMP) and I got a sense of Déjà vu. My professional career in the IC industry started at Texas instruments and the white paper made me think of a conversation I had with one of my colleagues over … Read More


High Sigma Yield Analysis and Optimization at DAC

High Sigma Yield Analysis and Optimization at DAC
by Daniel Payne on 06-02-2014 at 7:20 pm

When I hear the phrase “high sigma” I think of the EDA vendor Solido, however at DAC on Monday I visited another EDA company called MunEDAthat has several products of interest to transistor-level IC designers. I was able to speak with three different people from MunEDA and here’s what I learned.… Read More