SPIE Photomask Technology + Extreme Ultraviolet Lithography

SPIE Photomask Technology + Extreme Ultraviolet Lithography
by Admin on 06-21-2024 at 3:46 pm

Share your research and join the outstanding program for 2024

Make plans to join the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

Present your research in Monterey. Present your research in Monterey,

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A Primer on EUV Lithography

A Primer on EUV Lithography
by Fred Chen on 06-02-2023 at 6:00 am

Litho historical trend Fig 1

Extreme ultraviolet (EUV) lithography systems are the most advanced lithography systems in use today. This article is a basic primer on this important yet complex technology.

The Goal: A Smaller Wavelength

The introduction of 13.5 nm wavelength continues a trend the semiconductor industry had been following a wavelength reduction… Read More