Stochastic Pupil Fill in EUV Lithography

Stochastic Pupil Fill in EUV Lithography
by Fred Chen on 12-24-2024 at 6:00 am

Exposing EUV

Pupil fill tradeoff again

EUV lithography continues to be plagued by its stochastic nature.

This stochastic nature is most clearly portrayed by the random fluctuation of the absorbed photon number at a given location. For example, consider an absorbed dose of 10 mJ/cm2 amounts to 6.8 photons of energy 92 eV absorbed in a square … Read More