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A comprehensive update to the EUV stochastic image model
In extreme ultraviolet (EUV) lithography, photoelectron/secondary electron blur and secondary electron yield are known to drive stochastic fluctuations in the resist [1-3], leading to the formation of random defects and the degradation of pattern fidelity at advanced
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There is growing awareness that EUV lithography is actually an imaging technique that heavily depends on the distribution of secondary electrons in the resist layer [1-5]. The stochastic aspects should be traced not only to the discrete number of photons absorbed but also the electrons that are subsequently released. The electron… Read More
