Memory Cell Characterization with a Fast 3D Field Solver

Memory Cell Characterization with a Fast 3D Field Solver
by Daniel Payne on 09-29-2011 at 12:07 pm

Memory designers need to predict the timing, current and power of their designs with high accuracy before tape-out to ensure that all the design goals will be met. Extracting the parasitic values from the IC layout and then running circuit simulation is a trusted methodology however the accuracy of the results ultimately depend… Read More


Nanometer Circuit Verification: The Catch-22 of Layout!

Nanometer Circuit Verification: The Catch-22 of Layout!
by Daniel Nenni on 09-19-2011 at 8:00 pm

As analog and mixed-signal designers move to very advanced geometries, they must grapple with more and more complex considerations of the silicon. Not only do nanometer CMOS devices have limitations in terms of analog-relevant characteristics such gain and noise performance, but they also introduce new sources of variation… Read More


Fast Track Seminars

Fast Track Seminars
by Paul McLellan on 09-15-2011 at 6:11 pm


Atrenta’s SoC realization seminars, “Fast Track Your SoC Design” have started.The first one was in Ottowa last Tuesday, and it was a full house. In a straw poll, most of the attendees acknowledged facing IP handoff and quality issues. The keynote speaker was Dr Yuejian Wu, director of ASIC development at Infinera… Read More


Hardware Configuration Management approach awarded a Patent

Hardware Configuration Management approach awarded a Patent
by Daniel Payne on 09-13-2011 at 11:21 am

Hardware designers use complex EDA tool flows that have collections of underlying binary and text files. Keeping track of the versions of your IC design can be a real issue when your projects use teams of engineers. ClioSoft has been offering HCM (Hardware Configuration Management) tools that work in the most popular flows of: … Read More


When analog/RF/mixed-signal IC design meets nanometer CMOS geometries!

When analog/RF/mixed-signal IC design meets nanometer CMOS geometries!
by Daniel Nenni on 09-13-2011 at 9:22 am

In working with TSMC and GlobalFoundries on AMS design reference flows I have experienced first hand the increasing verification challenges of nanometer analog, RF, and mixed-signal circuits. Tools in this area have to be both silicon accurate and blindingly fast! Berkeley Design Automation is one of the key vendors in this … Read More


2.5D and 3D designs

2.5D and 3D designs
by Paul McLellan on 09-07-2011 at 1:54 pm

Going up! Power and performance issues, along with manufacturing yield issues, limit how much bigger chips can get in two dimensions. That, and the fact that you can’t manufacture two different processes on the same wafer, mean that we are going up into the third dimension.

The simplest way is what is called package-in-package… Read More


Nanometer Circuit Verification Forum

Nanometer Circuit Verification Forum
by Daniel Nenni on 08-29-2011 at 2:33 pm

Verifying circuits on advanced process nodes has always been difficult, and it’s no easier with today’s nanometer CMOS processes. There’s a great paradox in nanometer circuit design and verification. Designers achieve their greatest differentiation when they implement analog, mixed-signal, RF and custom … Read More


Transistor Level IC Design?

Transistor Level IC Design?
by Daniel Payne on 08-26-2011 at 1:23 pm

If you are doing transistor-level IC design then you’ve probably come up against questions like:

  • What Changed in this schematic sheet?
  • How did my IC layout change since last week?

In the old days we would hold up the old and new versions of the schematics or IC layout and try to eye-ball what had changed. Now we have an automated… Read More


Third Generation DFM Flow: GLOBALFOUNDRIES and Mentor Graphics

Third Generation DFM Flow: GLOBALFOUNDRIES and Mentor Graphics
by Daniel Payne on 08-26-2011 at 11:17 am

calibre yield analyzer

Introduction
Mentor Graphics and GLOBALFOUNDRIES have been working together for several generations since the 65nm node on making IC designs yield higher. Michael Buehler-Garcia, director of Calibre Design SolutionsMarketing at Mentor Graphics spoke with me by phone today to explain how they are working with GLOBALFOUNDRIESRead More


20nm SoC Design

20nm SoC Design
by Paul McLellan on 08-25-2011 at 12:48 am

There are a large number of challenges at 20nm that didn’t exist at 45nm or even 32nm.

The biggest issues are in the lithography area. Until now it has been possible to make a reticle using advanced reticle enhacement technology (RET) decoration and have it print. Amazing when you think that at 45nm we are making 45nm features… Read More