Some of Intel’s technology posts make some pretty specific statements and I have seen a number of posts where people seem to have misinterpreted what Intel was actually saying.
Multi Patterning
I have seen a lot of confusion on this one with some people saying Intel didn’t use multi patterning at 22nm and others saying Intel used … Read More
At major EDA events, CEDA (the IEEE council on EDA, I guess you already know what that bit stands for) hosts a lunch and presentation for attendees and others. This week was ICCAD and the speaker was Lars Liebmann of IBM on The Escalating Design Impact of Resolution-Challenged Lithography. Lars decided to give us a whirlwind tour … Read More
When TSMC and Mentor Graphics held a joint seminar for mutual customers to go over new DFM requirements at 45/40 nm, two customers basically asked the same question, “What do you mean by mandatory?” Of course, TSMC wasn’t going to stand over them and say, “Mandatory means mandatory, what part of mandatory don’t you understand?” … Read More
When TSMC and Mentor Graphics held a joint seminar for mutual customers to go over new DFM requirements at 45/40 nm, two customers basically asked the same question, “What do you mean by mandatory?” Of course, TSMC wasn’t going to stand over them and say, “Mandatory means mandatory, what part of mandatory don’t you understand?” … Read More
In my submission about TSMC making some DFM analysis steps mandatory at 45nm (see “TSMC’s DFM Announcement”), I ended with a question about why the foundries can’t just write better design rules (and rule decks) to make sure all designs yield well. Here’s my take on this complicated question.… Read More
If you are a TSMC customer, no doubt you have heard TSMC is requiring lithography and planarity analysis for all 45nm designs. Their website says customers can either run it themselves, or contract TSMC services to do it. The most cost-effective way would be for the customers to run it themselves, but some might not have the resources… Read More
In my submission about TSMC making some DFM analysis steps mandatory at 45nm (see “TSMC’s DFM Announcement”), I ended with a question about why the foundries can’t just write better design rules (and rule decks) to make sure all designs yield well. Here’s my take on this complicated question.… Read More
If you are a TSMC customer, no doubt you have heard TSMC is requiring lithography and planarity analysis for all 45nm designs. Their website says customers can either run it themselves, or contract TSMC services to do it. The most cost-effective way would be for the customers to run it themselves, but some might not have the resources… Read More
