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Mask Metrology Research and Development Engineer

Mask Metrology Research and Development Engineer
by Admin on 04-28-2022 at 3:02 pm

Website TSMC

Description

 

1. Establish metrology systems for optical properties of mask multi-layer thin film.
2. Cooperate with laboratories in colleges or institutes to develop new metrology techniques for mask quality measurement.
3. Cooperate with vendors for new metrology tool development.
4. Simulate the optical properties for new mask material development.
5. Develop mask quality KPI by SEM image analysis.

 

Qualifications

 

1. Master’s degree or above, PhD is preferred. Major in Optical Engineering, Mechanical Engineering Physics, or related fields.
2. With personality of scrupulous, patience, accountable and carefulness is necessary.
3. Familiar with programming language, e.g., MATLAB/VB/SQL/Python is a plus.
4. Familiar with EUV mask processes knowledge is a plus.
5. Self-motivated, strong project management and good communication skill.
Apply for job

To view the job application please visit tsmc.taleo.net.

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