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Mastering Copper TSV Fill Part 2 of 3

Mastering Copper TSV Fill Part 2 of 3
by John Ghekiere on 05-29-2024 at 8:00 am

Mastering Copper TSV Fill Part 2 of 3

Establishing void-free fill of high aspect ratio TSVs, capped by a thin and uniform bulk layer optimized for removal by CMP, means fully optimizing each of a series of critical phases. As we will see in this 3-part series, the conditions governing outcomes for each phase vary greatly, and the complexity of interacting factors means… Read More


AI System Connectivity for UCIe and Chiplet Interfaces Demand Escalating Bandwidth Needs

AI System Connectivity for UCIe and Chiplet Interfaces Demand Escalating Bandwidth Needs
by Kalar Rajendiran on 05-27-2024 at 10:00 am

Alphwave Semi UCIe PHY Support for All Package Types

Artificial Intelligence (AI) continues to revolutionize industries, from healthcare and finance to automotive and manufacturing. AI applications, such as machine learning, deep learning, and neural networks, rely on vast amounts of data for training, inference, and decision-making processes. As AI algorithms become … Read More


Mastering Copper TSV Fill Part 1 of 3

Mastering Copper TSV Fill Part 1 of 3
by John Ghekiere on 05-22-2024 at 8:00 am

Mastering Copper TSV Fill Part 1 of 3

Establishing void-free fill of high aspect ratio TSVs, capped by a thin and uniform bulk layer optimized for removal by CMP, means fully optimizing each of a series of critical phases. As we will see in this 3-part series, the conditions governing outcomes for each phase vary greatly, and the complexity of interacting factors means… Read More


Synopsys Accelerates Innovation on TSMC Advanced Processes

Synopsys Accelerates Innovation on TSMC Advanced Processes
by Mike Gianfagna on 05-15-2024 at 10:00 am

Synopsys Accelerates Innovation on TSMC Advanced Processes

We all know that making advanced semiconductors is a team sport. TSMC can innovate the best processes, but without the right design flows, communication schemes and verified IP it becomes difficult to access those processes. Synopsys recently announced some details on this topic. It covers a lot of ground. The graphic at the top… Read More


Successful 3DIC design requires an integrated approach

Successful 3DIC design requires an integrated approach
by Kalar Rajendiran on 11-13-2023 at 6:00 am

Siemens EDA 3DIC Graphics

While the leap from traditional SoC/IC designs to Three-Dimensional Integrated Circuits (3DICs) designs brings new benefits and opportunities, it also introduces new challenges. The benefits include performance, power efficiency, footprint reduction and cost savings. The challenges span design, verification, thermal… Read More


Ensuring 3D IC Semiconductor Reliability: Challenges and Solutions for Successful Integration

Ensuring 3D IC Semiconductor Reliability: Challenges and Solutions for Successful Integration
by Kalar Rajendiran on 10-25-2023 at 10:00 am

3D IC Cross Section Illustration

One of the most promising advancements in the semiconductor field is the development of 3D Integrated Circuits (3D ICs). 3D ICs enable companies to partition semiconductor designs and seamlessly integrate silicon Intellectual Property (IP) at the most suitable process nodes and processes. This strategic partitioning yields… Read More


WEBINAR: Revolutionizing Chip Design with 2.5D/3D-IC Design Technology

WEBINAR: Revolutionizing Chip Design with 2.5D/3D-IC Design Technology
by Daniel Nenni on 06-12-2023 at 10:00 am

Figure 1 (2)

In the 3D-IC (Three-dimensional integrated circuit) chip design method, chiplets or wafers are stacked vertically on top of each other and are connected using Through Silicon Vias (TSVs) or hybrid bonding.

The 2.5D-IC design method places multiple chiplets alongside each other on a silicon interposer. Microbumps and interconnect… Read More