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1.7X density number is misleading as well if we compare the densest library between the improvement is only 1.56X. https://fuse.wikichip.org/news/7375/tsmc-n3-and-challenges-ahead/
Hmm - what's the source for 0.015-0.016? -- this thread shows 0.0199 (N3B) and 0.021 (N3E) https://semiwiki.com/forum/threads/tsmc-officially-halts-sram-scaling.17223/ Perhaps this source…
The University of Liverpool and Pragmatic Semiconductor Ltd are seeking a Process Technologist to develop ALD thin film materials, for flexible electronics technology.
You will lead and manage the project, with support from the company and university academics.
You will have a BEng/BSc or PhD in a materials-related or engineering discipline, with research skills in thin film deposition and /or semiconductor device fabrication and characterisation.
Experience with semiconductor processing technologies is desirable. We seek individuals with excellent communication skills and who want to work both in industry and academia.
The post is up to 12-month fixed-term contract, based at the company premises in Sedgefield.
1.7X density number is misleading as well if we compare the densest library between the improvement is only 1.56X. https://fuse.wikichip.org/news/7375/tsmc-n3-and-challenges-ahead/
Hmm - what's the source for 0.015-0.016? -- this thread shows 0.0199 (N3B) and 0.021 (N3E) https://semiwiki.com/forum/threads/tsmc-officially-halts-sram-scaling.17223/ Perhaps this source…
TSMC N3 Process Technology Wiki