Dan is joined by Malcolm Penn, CEO of Future Horizons. Malcolm is a contributor to SemiWiki and a frequent podcast guest.
Dan and Malcolm discuss what happened in the semi industry last year and what 2023 and 2024 will look like and why. The discussion is a preview to Malcolm’s upcoming Industry Update Webinar on January … Read More
The semiconductor ecosystem consolidation continues with an interesting acquisition of an EDA company by an IP company. Having worked with both Arteris and Semifore over the past few years I can tell you by personal experience that this is one of those 1+1=3 types of acquisitions, absolutely.
Semifore was founded in 2006 by a team… Read More
*Company email required for registration*
Register Transfer Level (RTL) power analysis, performed early in the design cycle, is a key component of end-to-end methodology to maximize energy efficiency. Such analysis has become a critical requirement for many IC designs today and in the future. Although RTL power analysis technology… Read More
“We intend to grow revenue 14% to 15%, continue to drive notable ops margin expansion and aim for approximately 16% non-GAAP earnings per share growth.”
Synopsys, Inc. (NASDAQ:SNPS) Q4 2022 Earnings Call Transcript
Synopsys is the EDA bellwether since they report early and are the #1 EDA and #1 IP company. In addition to crossing… Read More
*Company emails are required for this webinar*
This webinar will introduce to you a revolutionary new way to do prototyping and emulation at best-in-class performance, productivity, and pricing by unifying the hardware and a new software stack so one system is capable of prototyping and delivering essential emulation functionality.… Read More
*Company email is required for registration*
In this live webinar, we will take a look at MACsec as a persuasive security solution for the Open-RAN Fronthaul. We will understand the very sensitive data that the fronthaul transports, its strict high-performance requirements, and the urgent need to secure it against several threats… Read More
Readers of SemiWiki will be well aware of the challenges the industry has faced in photolithography in moving to new nodes, which drove the development of new EUV light sources as well as new masking techniques. Plasma etching is another key step in chip manufacturing that has also seen new challenges in the development of new sub-10nm… Read More
At the recent SPIE Advanced Lithography + Patterning Conference, Mark Phillips from Intel gave an insightful update on the status of the introduction of the 0.55 high numerical aperture extreme ultraviolet lithography technology. Mark went so far as to assert that the development progress toward high-NA EUV would support … Read More