Noise, The Need for Speed, and Machine Learning

Noise, The Need for Speed, and Machine Learning
by Riko Radojcic on 05-08-2017 at 7:00 am

Technology trends make the concerns with electronic noise a primary constraint that impacts many mainstream products, driving the need for “Design-for-Noise” practices. That is, scaling, and the associated reduction in the device operating voltage and current, in effect magnifies the relative importance of non-scalableRead More


Magic? No! It’s Computational Lithography

Magic? No! It’s Computational Lithography
by Beth Martin on 02-11-2013 at 7:00 am

The industry plans to use 193nm light at the 20nm, 14nm, and 10nm nodes. Amazing, no? There is no magic wand; scientists have been hard at work developing computational lithography techniques that can pull one more rabbit out of the optical lithography hat.

Tortured metaphors aside, the goal for the post-tapeout flow is the same… Read More


DFM at SPIE Advance Litho show

DFM at SPIE Advance Litho show
by Beth Martin on 02-09-2012 at 6:40 pm

This year’s SPIE Advanced Lithography is loaded with interesting keynotes and sessions. To help me narrow down what to see, I spoke with John Sturtevant. John is co-chair of the Design for Manufacturability through Design-Process Integration conference, and the director for technical marketing for RET products at Mentor Graphics.… Read More


The Future of Lithography Process Models

The Future of Lithography Process Models
by Beth Martin on 01-30-2012 at 4:02 pm

Always in motion is the future. ~Yoda

For nearly ten years now, full-chip simulation engines have successfully used process models to perform OPC in production. New full-chip models were regularly introduced as patterning processes evolved to span immersion exposure, bilayer resists, phase shift masking, pixelated illumination… Read More


Evolution of Lithography Process Models, Part II

Evolution of Lithography Process Models, Part II
by Beth Martin on 03-24-2011 at 3:56 pm

In part I of this series, we looked at the history of lithography process models, starting in 1976. Some technologies born in that era, like the Concorde and the space shuttle, came to the end of their roads. Others did indeed grow and develop, such as the technologies for mobile computing and home entertainment. And lithography … Read More


With EUVL, Expect No Holiday

With EUVL, Expect No Holiday
by Beth Martin on 03-02-2011 at 1:12 pm

For a brief time in the 1990s, when 4X magnification steppers suddenly made mask features 4X larger, there was a period in the industry referred to as the “mask vendor’s holiday.” The party ended before it got started with the arrival of sub-wavelength lithography, and we all trudged back to the OPC/RET mines. Since then, the demands… Read More


Evolution of process models, part I

Evolution of process models, part I
by Beth Martin on 02-23-2011 at 1:15 pm

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Thirty five years ago, in 1976, the Concorde cut transatlantic flying time to 3.5 hrs, Apple was formed, NASA unveiled the first space shuttle, the VHS vs Betamax wars started, and Barry Manilow’s I Write the Songs saturated the airwaves. Each of those advances, except perhaps Barry Manilow, was the result of the first modern-era,… Read More