The Future of Chip Design with the Cadence iSpatial Flow

The Future of Chip Design with the Cadence iSpatial Flow
by Mike Gianfagna on 07-06-2020 at 10:00 am

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A few months ago, I wrote about the announcement of a new digital full flow from Cadence. In that piece, I focused on the machine learning (ML) aspects of the new tool. I had covered a discussion with Cadence’s Paul Cunningham a week before that explored ML in Cadence products, so it was timely to dive into a real-world example of the … Read More


FinFET & Multi-patterning Need Special P&R Handling

FinFET & Multi-patterning Need Special P&R Handling
by Pawan Fangaria on 04-28-2014 at 1:00 pm

I think by now a lot has been said about the necessity of multi-patterning at advanced technology nodes with extremely low feature size such as 20nm, because lithography using 193nm wavelength of light makes printing and manufacturing of semiconductor design very difficult. The multi-patterning is a novel semiconductor manufacturing… Read More


Macro Placement Challenges

Macro Placement Challenges
by Paul McLellan on 12-27-2013 at 7:28 pm

One of the challenges of physical design of a modern SoC is that of macro placement. Back when a design just had a few macros then the flooplanning could be handled largely manually. But modern SoCs suffer from a number of problems. A new white paper from Mentor covers Olympus-SOCs features to address these issues:

  • As we move to smaller
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