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At the 2022 SPIE Advanced Lithography Conference, ASML presented an update on EUV. I recently had a chance to go over the presentations with Mike Lercel of ASML. The following is a summary of our discussions.
0.33 NA
The 0.33 NA EUV systems are the production workhorse systems for leading edge lithography today. 0.33 NA systems are… Read More
At the imec technology forum held at SEMICON West, Martin Van Den Brink, President and CTO of ASML presented on the latest developments on EUV. I also had an opportunity to sit down with Mike Lercel, ASML Director of Strategic Marketing for an interview.… Read More
