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MLCAD Symposium 2024by Admin on 06-21-2024 at 2:41 pm
6th ACM/IEEE International Symposium on Machine Learning for CAD
September 9-11, 2024 in Snowbird, Utah!
Important Announcements
- Student travel grants: We are pleased to offer several travel grants to students. Read more.
- Journal special issue: Following MLCAD 2024, you will be invited to submit an expanded version.
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This is the first year that RAAAM is attending DAC and presenting its revolutionary on-chip memory technology. Remember, DAC is the #1 EDA networking event where new technologies are often launched and this is one of many examples for #DAC2024.
Modern chips in various applications, such as Artificial Intelligence (AI) and Machine… Read More
As artificial intelligence (AI) and machine learning (ML) models continue to evolve at a breathtaking pace, the demands on hardware for inference and real-time processing grow increasingly complex. Traditional hardware architectures for acceleration are proving inadequate to keep up with these rapid advancements in ML … Read More
Our workshop will feature content including, but not limited to, the following areas:
- Artificial Intelligence & Machine Learning (AI / ML)
- Continuing Education & Workforce Development
- Designing with Field Programmable Gate Arrays (FPGAs) / Systems on a Chip (SoCs) / New Devices
- FPGA & SoC Assurance
- Guidelines
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Data Driven Day 2024by Admin on 03-25-2024 at 2:53 pm
What will you find in this edition?
Intelligent data management in the Insurance sector
- In the insurance sector, the leap to artificial intelligence not only means a deeper understanding of risks and claims, but the ability to personalize products and services in unprecedented ways.
- Predictive AI models enable more accurate
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A thought leader with demonstrated history in multiple roles- project life cycles, ideation, implementation, and closing projects delivering business value and delighting stakeholders, crafting technical aspects of the company’s strategy for aligning with the business goals perfectly, discovering and implementing … Read More
Resist blur remains a topic that is relatively unexplored in lithography. Blur has the effect of reducing the difference between the maximum and minimum doses in the local region containing the feature. Blur is particularly important for EUV lithography since EUV lithography is prone to stochastic fluctuations and also driven… Read More
This is our third year working with Sondrel and it has been a great experience. I have always been fascinated with the ASIC business and put a full chapter about it in our first book “Fabless: The Transformation of the Semiconductor industry.” Companies like Sondrel enabled our move to the fabless model and now they … Read More
State-of-the-art electronics demand high performance, low power consumption, small footprint and high reliability from their semiconductor products. While this imperative is true across many different market segments, it is critical for applications such as the automotive/autonomous driving and data centers. As electronic… Read More