Why SOI is the Future Technology of Semiconductor

Why SOI is the Future Technology of Semiconductor
by Eric Esteve on 01-14-2014 at 8:34 am

No doubt that FDSOI generate high interest these days and I found a very interesting contribution from Zvi Or-Bach, President and CEO of MonolithIC 3D, Inc. Zvi has accepted to share his wrap-up from IEDM, in a blog for Semiwiki readers. If you remember the long discussion we had in Semiwiki about cost comparison, some comments were… Read More


Direct Write E-beam

Direct Write E-beam
by Paul McLellan on 07-13-2012 at 2:08 pm

One of the presenters at the standing-room only litho session at Semicon this week was Serge Tedesco, the litho program manager at CEA-Leti in Grenoble France. He is running a program called IMAGINE for maskless lithography. Chips today are built using a reticle (containing the pattern for that layer of the chip) which is exposed… Read More