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EUV lithography systems continue to be the source of much hope for continuing the pace of increasing device density on wafers per Moore’s Law. Recently, although EUV systems were originally supposed to help the industry avoid much multipatterning, it has not turned out to be the case [1,2]. The main surprise has been the
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First, the TSMC Museum of Innovation is now open and it’s quite impressive. Located right below Fab 12, it is definitely worth an hour of your time. Second, Morris Chang was on the investor call which made it much more interesting, especially his comments on the recent Report to the President on U.S. semiconductor leadership. Third,… Read More
