SPIE Advanced Lithography 2018 – ASML Update on EUV

SPIE Advanced Lithography 2018 – ASML Update on EUV
by Scotten Jones on 04-09-2018 at 7:00 am

At the SPIE Advanced Lithography Conference in February ASML gave an update on their EUV systems, in this blog I will provide a summary of what they presented. I have also written about my impressions on EUV for the overall conference here.… Read More


SPIE 2017 – imec papers and interview

SPIE 2017 – imec papers and interview
by Scotten Jones on 04-28-2017 at 12:00 pm

At the SPIE Advanced Lithography Conference imec published a number of papers on EUV, multi-patterning and other lithography issues. In addition to seeing several of the papers presented I had a chance to sit down with imec’s director of advanced patterning, Greg McIntyre. In this article I will summarize my discussions… Read More


An Steegen ISS Talk and Interview – Patterning Options for Advanced Nodes

An Steegen ISS Talk and Interview – Patterning Options for Advanced Nodes
by Scotten Jones on 02-28-2017 at 12:00 pm

At the ISS Conference in January, An Steegen EVP of Semiconductor Technology & Systems at imec gave a talk entitled “Patterning Options for Advanced Technology Nodes”. I was present for her talk and had the opportunity to have a follow up interview with An.… Read More