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TSMC OIP Ecosystem Forum Discussion

Daniel Nenni

Admin
Staff member
Thanks to the Ecosystem TSMC:
-Shipped one 7nm billion chips
-N5 entered volume production
-N3 development in progress

A record 37 OIP papers were accepted
All video pre recorded

Cliff Hou Keynote and 3 featured talks from EDA executives: Lip-Bu Tan, Aart de Geus, and Joe Sawicki

Related press releases:









 
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Cliff Hou SVP R&D TSMC Keynote:

TSMC Application Specific Platforms:

- Smartphone: Speed, power, and area
- Automotive: Reliability, functional safety, Standard compliance
- HPC: Sustainable performance, memory bandwidth, Reliability
- IoT: Ultra low power and ultra connectivity

Process Density Scaling:
N7 to N6 1.18x
N7 to N5 1.83x
N5 to N3 1.7x

Process Performance Scaling:
N7 to N6 +2%
N7 to N5 +13%
N5 to N3 +11%

Process Power Scaling
N7 to N6 -10%
N7 to N5 -21%
N5 to N3 -27%

N5 IP portfolio is fully ready for tape-outs

N3 is EDA tool/IP certified and ready for design

Automotive Development Platform
16nm -> N7-> N5 (2022)
Technology, design flow, manufacturing, and IP ecosystem

Qualification:
-tighten intrinsic reliability criteria
- target for grade-1 with stress at 125C

Design collaterals:
-SPICE Model - S2S accuracy
-aging model - reliability
- Auto DRM / EM Low DDPM

Design flow for automotive:
Additional reliability checks on device/metal degradation for automotive mixed signal design
Full automotive design enablement platform

IoT Platform
TSMC offers comprehensive low power platforms for IoT for a wide range of IoT applications
.18m eLL, 90nm ULP, 55ULP, 45 ULP, 22ULP, 22LL, and the new N12e FinFET
N12e is EDA and IP ready for Ultra Low Power Designs

TSMC 3D Fabric
Design ecosystem is ready to support chip, package, and systems implementation and verification.
- InFO Package Design Solution
- CoWos Package Design Solution
- TSMC-SoIC Design Solution
- Package-Chip Integration and Verification
- 3D Fabric Design Solution Readiness

Summary
- N3 continues PPA trend for both smartphone and HPC applications. Design solution is ready for PPA exploration
- N5, N6, and N7 design solutions and ecosystem are ready and used for production chips
- Developed comprehensive automotive design ecosystem on N16 and N7. Will extend to N5 in 2022
- N12e enables further speed and enhancement to support AI enabled IoT products
- Built comprehensive 3D Fabric design platform to enable more system performance
 
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New technologies driven by AI and Data-centric Industry Trends
Lip-Bu Tan, Cadence CEO and Investor Extraordinaire

Five generation trends:

5G
Hyperscale
Industrial IoT
AI

Data is Driving a Silicon Renaissance
- data analysis
- data transmission
- data processing
- data storage

TSMC, Arm, Cadence collaboration
- EDA flow certification for N3
- IP and EDA flow certification for TSMC N6 and N5
- Optimized EDA flow for Arm Cortex N7 and N5
- DDR5/LPDDR5 IP for N5 hyperscale and automotive
- 112/56 SerDes for N6 and N5 datacenter chips
- 3D IC collaboration on 2.5 and 3D IC flows
- Clarity Solver certified for CoWos flow

Benefits
- Advanced technologies
- Silicon proven IP
- Optimized design flows
- Cloud enabled (Cadence and TSMC have a serious cloud partnership)
 
Innovation = TSMC to the power of Synopsys
Aart de Geus, Chairman & Co-CEO, Synopsys


-Innovation continues at a rapid rate
-Silicon and Software have never been closer
-Success is the product of our efforts (not SUM)

(TSMC)
- System level innovation
- Logic scaling
- Advanced packaging

Synopsys Fusion
P&R, Synthesis, timing, power, test, physical verification, etc...
- 2x+ faster from RTL to GDSII
- Better performance
- Lower power
- Smaller area
Applied to TSMC advanced technologies

Fusion understands manufacturing and Test
Fusion can then go up to architecture

Louis Sullivan (architect considered father of sky scrapers)
"Form follows function"
A principle associated with late 19th and early 20th century architecture and industrial design in general, and it means the shape of a building or object should primarily relate to its intended function or purpose.

Frank Lloyd Wright (fellow architect)
"Form and function should be one"

Semiconductors = form-physics-function


Moore's Law is form
More the Moore is function

Form: HW/SW prototyping, RTL architecture acceleration,

Function: 3D IC Design

Fusion takes form and function down to the physics of semiconductor design followed by manufacture and test

Fusion is now surrounded by cloud computing and machine learning

Fusion does design space exploration plus optimization
- Cloud and AI assisted design space optimization

Synopsys has the largest library of TSMC silicon proven IP

TSMC to the power of Synopsys
 
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Reinventing the World - One Process Node at a Time
Joseph Sawicki, Executive VP, Mentor


Historical SoC example:
2013 28nm, die size 102mm2, 1 billion transistors, speed 269 (Geekbench single core)
2019 7nm, die size 98mm2, 8.5 billion transistors speed 1331 (geekbench single core)
Graphcore AI accelerator for the cloud @ 23 billion transistors, a serious test and verification challenge if not for OIP

"Moore's Law is not Dead, or even sick, TSMC thinks it can hold up Moore's Law for decades"

TSMC and Mentor Addressing OIP Ecosystem Reliability

- Latchup (LUP) Methodology
- ESD Verification
- Calibre PERC

Mentor and TSMC Accelerating Verification TAT
- Physical verification Calibre nm DRC-Recon 6x Improvement
- Circuit Verification Calibre nm LVS-Recon 30x Improvement

Silicon Creations Example:
Delivered >300 IP with TSMC down to N3
200+ different PLL designs
500+ customer chips in production at TSMC

IP Targets:
Automotive
Aerospace
Consumer
Data Center
Industrial
IoT

Tanner: Silicon Photonics and Partnership with TSMC
- MEMS, AMS, Silicon Photonics
MEMS/IC Co-design
Draw and edit
Curved geometries
- AMS
Full custom AMS design flow
Integrated with other Mentor tools
- Silicon Photonics
Complete photonics with electronics design
Integrates with leading photonics simulation tools

More than Moore Silicon
- Calibre 3D Stack verification environment
- Integration with between Calibre and Xpedition packaging
 
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