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[/FONT] [table] align="center" style="width: 600px"
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| align="left" valign="top" width="430" | [FONT=verdana, arial, helvetica, sans-serif] Wafer Processing and Advanced Semiconductor Manufacturing at SEMICON West 2014
[/FONT][FONT=verdana, arial, helvetica, sans-serif] Moore may still be the law, but advances in microelectronics design and applications are driving change in process and materials technologies beyond device scaling. Mobile devices, "Internet of Things" technologies, next-generation memory, and power devices are just some of the growing markets demanding innovation in semiconductor manufacturing.
<center>
</center> At SEMICON West 2014, you will connect with the people, companies, and technologies driving advanced microelectronics manufacturing. Exhibits, displays, programs will address the latest innovations for front-end device manufacturing in topic areas including:
Wafer Processing/Front-End Device Manufacturing Programs
[table] style="width: 430px"
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| colspan="2" align="left" valign="top" width="430" | [FONT=verdana, arial, helvetica, sans-serif] Tuesday, July 8, 2014[/FONT]
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| colspan="2" width="430" |
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| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 9:00am-12:00pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] STS Session: Challenges, Innovations and Drivers in Metrology
Session Partner: SEMATECH
Moscone North, Hall E, Room 130 [/FONT]
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| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 1:30pm-4:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] STS Session: Yield Session: Defectivity and Process Variability-Inspection, Defect Reduction Challenges and Process Controls at the Sub 20nm Nodes
Session Partner: SEMATECH
Moscone North, Hall E, Room 130 [/FONT]
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| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 1:30pm-4:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] Variability Control-A Key Challenge and Opportunity for Driving Towards Manufacturing Excellence
Session Partner: SEMATECH
TechXPOT South, South Hall [/FONT]
|-
| colspan="2" width="430" |
|-
| colspan="2" align="left" valign="top" width="430" | [FONT=verdana, arial, helvetica, sans-serif] Wednesday, July 9, 2014[/FONT]
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| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 7:30am-10:00am[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] Sokudo Lithography Breakfast 2014
(Partner Event)
San Francisco Marriott Marquis [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 9:00am-12:00pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] STS Session: Getting to 5nm Devices: Evolutionary Scaling to Disruptive Scaling and Beyond
Moscone North, Hall E, Room131 [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 10:30am-12:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] Subcomponent Supply Chain Challenges for 10 nm and Beyond
Hosted by: SEMI Semiconductor Components, Instruments, and Subsystems Special Interest Group
TechXPOT South, South Hall [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 10:30am-12:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] Bringing Silicon Photonics to Market
TechXPOT North, North Hall [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 1:30pm-3:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] Productivity Session
Hosted by the Secondary Equipment and Applications Americas Chapter
TechXPOT South, South Hall [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 1:30pm-4:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] STS Session: Readiness of Advanced Lithography Technologies for HVM
Moscone North, Hall E, Room 131 [/FONT]
|-
| colspan="2" width="430" |
|-
| colspan="2" align="left" valign="top" width="430" | [FONT=verdana, arial, helvetica, sans-serif] Thursday, July 10, 2014[/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 7:30am-10:00am[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] Entegris Yield Breakfast Forum 2014
San Francisco Marriott Marquis [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 9:00am-12:00pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] STS Session: 450mm Technology Development Update
Moscone North, Hall E, Room 131 [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 1:30pm-4:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] STS Session: Breakthrough High Volume Manufacturing Innovations
Moscone North, Hall E, Room 131[/FONT]
|-
[/table]
[/FONT]
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[/table]
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[/FONT] [table] align="center" style="width: 600px"
|-
| align="left" valign="top" width="430" | [FONT=verdana, arial, helvetica, sans-serif] Wafer Processing and Advanced Semiconductor Manufacturing at SEMICON West 2014
[/FONT][FONT=verdana, arial, helvetica, sans-serif] Moore may still be the law, but advances in microelectronics design and applications are driving change in process and materials technologies beyond device scaling. Mobile devices, "Internet of Things" technologies, next-generation memory, and power devices are just some of the growing markets demanding innovation in semiconductor manufacturing.
<center>
</center> At SEMICON West 2014, you will connect with the people, companies, and technologies driving advanced microelectronics manufacturing. Exhibits, displays, programs will address the latest innovations for front-end device manufacturing in topic areas including:
- New transistor architectures: FinFETs
- Advanced substrate technologies: FDSOI
- Challenges for next-generation memory devices: RRAM, PCRAM, MRAM
- Equipment and materials challenges for 10nm and beyond
- The latest updates on 450mm, EUV, and 3D-IC
Wafer Processing/Front-End Device Manufacturing Programs
[table] style="width: 430px"
|-
| colspan="2" align="left" valign="top" width="430" | [FONT=verdana, arial, helvetica, sans-serif] Tuesday, July 8, 2014[/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 9:00am-12:00pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] STS Session: Challenges, Innovations and Drivers in Metrology
Session Partner: SEMATECH
Moscone North, Hall E, Room 130 [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 1:30pm-4:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] STS Session: Yield Session: Defectivity and Process Variability-Inspection, Defect Reduction Challenges and Process Controls at the Sub 20nm Nodes
Session Partner: SEMATECH
Moscone North, Hall E, Room 130 [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 1:30pm-4:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] Variability Control-A Key Challenge and Opportunity for Driving Towards Manufacturing Excellence
Session Partner: SEMATECH
TechXPOT South, South Hall [/FONT]
|-
| colspan="2" width="430" |
|-
| colspan="2" align="left" valign="top" width="430" | [FONT=verdana, arial, helvetica, sans-serif] Wednesday, July 9, 2014[/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 7:30am-10:00am[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] Sokudo Lithography Breakfast 2014
(Partner Event)
San Francisco Marriott Marquis [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 9:00am-12:00pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] STS Session: Getting to 5nm Devices: Evolutionary Scaling to Disruptive Scaling and Beyond
Moscone North, Hall E, Room131 [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 10:30am-12:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] Subcomponent Supply Chain Challenges for 10 nm and Beyond
Hosted by: SEMI Semiconductor Components, Instruments, and Subsystems Special Interest Group
TechXPOT South, South Hall [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 10:30am-12:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] Bringing Silicon Photonics to Market
TechXPOT North, North Hall [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 1:30pm-3:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] Productivity Session
Hosted by the Secondary Equipment and Applications Americas Chapter
TechXPOT South, South Hall [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 1:30pm-4:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] STS Session: Readiness of Advanced Lithography Technologies for HVM
Moscone North, Hall E, Room 131 [/FONT]
|-
| colspan="2" width="430" |
|-
| colspan="2" align="left" valign="top" width="430" | [FONT=verdana, arial, helvetica, sans-serif] Thursday, July 10, 2014[/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 7:30am-10:00am[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] Entegris Yield Breakfast Forum 2014
San Francisco Marriott Marquis [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 9:00am-12:00pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] STS Session: 450mm Technology Development Update
Moscone North, Hall E, Room 131 [/FONT]
|-
| colspan="2" width="430" |
|-
| align="left" valign="top" width="130" | [FONT=verdana, arial, helvetica, sans-serif] 1:30pm-4:30pm[/FONT]
| align="left" valign="top" width="300" | [FONT=verdana, arial, helvetica, sans-serif] STS Session: Breakthrough High Volume Manufacturing Innovations
Moscone North, Hall E, Room 131[/FONT]
|-
[/table]
[/FONT]
|-
[/table]
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