http://www.asml.com/doclib/investor/asml_6_Investor_Day-EUV_FvHout1.pdf (Slides 27 and 28)
Similar to NXE:3300B's being discontinued in 2015, the NXE:3350B looks like it will be discontinued in mid-2017, as part of the natural progression of the EUV tool's evolution at ASML, according to its roadmap. It is expected to be succeeded by the NXE:3400B at that time. It is expected to be essentially a restricted pattern tool with 13 nm resolution with nearly-pure dipole illumination with much reduced pupil fill. It would need double patterning for 5 nm logic node, which is the likely expected interception point. If they are trying to extend to 13 nm, it makes me wonder if they will try to introduce anamorphic (8x by 4x) magnification on the NXE:3400 even with the same NA (0.33) since 13 nm would otherwise be very difficult (16 nm already shows severe asymmetry).
Similar to NXE:3300B's being discontinued in 2015, the NXE:3350B looks like it will be discontinued in mid-2017, as part of the natural progression of the EUV tool's evolution at ASML, according to its roadmap. It is expected to be succeeded by the NXE:3400B at that time. It is expected to be essentially a restricted pattern tool with 13 nm resolution with nearly-pure dipole illumination with much reduced pupil fill. It would need double patterning for 5 nm logic node, which is the likely expected interception point. If they are trying to extend to 13 nm, it makes me wonder if they will try to introduce anamorphic (8x by 4x) magnification on the NXE:3400 even with the same NA (0.33) since 13 nm would otherwise be very difficult (16 nm already shows severe asymmetry).