Hitachi Electron Microscope View of a 5nm FinFET

[Daniel Nenni]

How does it look Fred? Do you have one of these microscopes?

A TEM lamella of a 5 nm node FinFET was prepared in the Wg direction to contain just one gate layer. While backside FIB milling was performed to mitigate curtaining, 2 kV finishing was applied to reduce FIB-induced damage. Obtained high resolution TEM images clearly showed the shape of Fins with little FIB-induced damage.

Available instruments for this measurement are :
FIB-SEM
https://lnkd.in/guecyxGm
200kV FE-TEM
https://lnkd.in/gr_74izG

Further details and previously posted applications can be found on our YouTube channel. Looking forward to your visit.
https://lnkd.in/gHbtZ-N

 

[Fred Chen]

Incredible image. What's the "2 kV finishing" to reduce the FIB damage?

Fin pitch > 30 nm here.

 

[Kazkek]

Incredible image. What's the "2 kV finishing" to reduce the FIB damage?

https://ieeexplore.ieee.org/document/5531982

 

[Fred Chen]

https://ieeexplore.ieee.org/document/5531982

@Kazkek, thanks very much for the reference!