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I am trying to get my head around the importance of humidity control in a semiconductor manufacturing facility. Can anyone provide some info on the following?
What’s the target RH range, and how tightly is it monitored?
Are there specific steps in the manufacturing process (e.g., lithography, etching, wafer storage) that are especially humidity-sensitive?
How important is compliance vs. operational performance when it comes to humidity?
Who in the facility is responsible for monitoring humidity levels?
Photolithography is the most critical and is typically controlled to + or - 1%, the rest of the fab is more like + or - 5%.
Humidity is monitored and controlled in real time by the facility management system. For large fabs with a centralized control room it would be monitored there. In modern fabs humidity typically runs in spec 100% of the time.
