Closing the Stochastics Resolution Gap

Closing the Stochastics Resolution Gap
by Admin on 07-20-2025 at 6:00 am

Closing the Stochastics Resolution Gap

The relentless miniaturization of semiconductor devices has always relied on achieving ever-smaller features on silicon wafers. However, as the industry enters the realm of extreme ultraviolet (EUV) lithography, it faces a critical barrier: stochastics, or the inherent randomness in patterning at atomic scales. This phenomenon… Read More


The Stochastic Impact of Defocus in EUV Lithography

The Stochastic Impact of Defocus in EUV Lithography
by Fred Chen on 06-28-2020 at 6:00 am

The Stochastic Impact of Defocus in EUV Lithography

The stochastic nature of imaging has received a great deal of attention in the area of EUV lithography. The density of EUV photons reaching the wafer is low enough [1] that the natural variation in the number of photons arriving at a given location can give rise to a relatively large standard deviation.

In recent studies [2,3], it … Read More