The SPIE Advanced Lithography Conference is the world’s premier conference for patterning techniques utilized to manufacture semiconductors. At any given time during the conference there are multiple parallel sessions so it is impossible to see all of the papers presented. Prior to the conference I reviewed and blogged on … Read More
- ASML making progress – but is it fast enough?
- ASML has missed 10nm , can it catch 7nm? An economic question
- Day one at SPIE- Better tone than last year but still cautious
1000 simulated wafers versus 700 simulated
At the opening of the SPIE conference ASML announced that TSMC had reached 1000 wafers a day “exposed”… Read More