Place & Route with FinFETs and Double Patterning

Place & Route with FinFETs and Double Patterning
by Paul McLellan on 09-29-2014 at 8:00 am

Image RemovedPlace & route in the 16/14nm era requires a new approach since it is significantly more complex. Of course, every process generation is more complex than the one before and the designs are bigger. But modern processes have new problems. The two biggest changes are FinFETs and double patterning.

FinFETs, as I assume… Read More


IC Place and Route Perspective from Users at DAC

IC Place and Route Perspective from Users at DAC
by Daniel Payne on 05-22-2013 at 11:44 am

One of the most useful ways to learn about an EDA tool is to talk with other users that have experience with that tool. IC Place and Route tools are complex and yet necessary to implement every SoC designed today, so at DAC in just two weeks you have a chance to hear first-hand from several P&R tool users. To get a better idea about these… Read More