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With EUVL, Expect No Holidayby Beth Martin on 03-02-2011 at 1:12 pmCategories: EDA, Siemens EDA
For a brief time in the 1990s, when 4X magnification steppers suddenly made mask features 4X larger, there was a period in the industry referred to as the “mask vendor’s holiday.” The party ended before it got started with the arrival of sub-wavelength lithography, and we all trudged back to the OPC/RET mines. Since then, the demands… Read More